WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2013146586) PHOTOSENSITIVE RESIN COMPOSITION FOR CTP FLEXOGRAPHIC PRINTING ORIGINAL PLATES AND PRINTING ORIGINAL PLATE OBTAINED FROM SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/146586 International Application No.: PCT/JP2013/058284
Publication Date: 03.10.2013 International Filing Date: 22.03.2013
IPC:
G03F 7/00 (2006.01) ,G03F 7/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004
Photosensitive materials
027
Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Applicants: TOYOBO CO., LTD.[JP/JP]; 2-8, Dojima Hama 2-chome, Kita-ku, Osaka-shi, Osaka 5308230, JP
Inventors: YAMADA, Hiroto; JP
YAWATA, Yukimi; JP
YOSHIMOTO, Kazuya; JP
Agent: KAZAHAYA, Nobuaki; Shin-Ei Building 6th Fl., 6-20, Tosabori 1-chome, Nishi-ku, Osaka-shi, Osaka 5500001, JP
Priority Data:
2012-08026530.03.2012JP
2013-01656231.01.2013JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION FOR CTP FLEXOGRAPHIC PRINTING ORIGINAL PLATES AND PRINTING ORIGINAL PLATE OBTAINED FROM SAME
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE POUR PLAQUES INITIALES D'IMPRESSION FLEXOGRAPHIQUE CTP ET PLAQUE INITIALE D'IMPRESSION OBTENUE À PARTIR DE CELLE-CI
(JA) CTPフレキソ印刷原版用感光性樹脂組成物およびそれから得られる印刷原版
Abstract:
(EN) Provided is a CTP photosensitive flexographic printing original plate which is free from the generation of thin spots in print, while maintaining the printing durability, image reproducibility and developability of conventional flexographic printing original plates. The present invention is a photosensitive resin composition which contains at least (A) a hydrophobic polymer that is obtained from a water-dispersed latex, (B) a hydrophilic polymer, (C) a photopolymerizable unsaturated compound, (D) a photopolymerization initiator, and if necessary (E) a rubber. This photosensitive resin composition is characterized in that the photopolymerizable unsaturated compound (C) is formed of (C-1) a photopolymerizable oligomer that does not contain a hydroxyl group, (C-2) a hydroxyl group-containing photopolymerizable monomer that has a pentaerythritol skeleton, a dipentaerythritol skeleton or a glycerin skeleton, and if necessary (C-3) a photopolymerizable monomer that does not contain a hydroxyl group. It is preferable that the content of the hydroxyl group-containing photopolymerizable monomer (C-2) is 1-20% by mass of the photosensitive resin composition and the content of the rubber (E) is 0.5-15% by mass of the photosensitive resin composition.
(FR) L'invention concerne une plaque initiale d'impression flexographique photosensible CTP qui ne présente pas de génération de taches minces pendant l'impression, tout en maintenant la durabilité d'impression, la reproductibilité de l'image et l'aptitude au développement de plaques initiales d'impression flexographique classiques. La présente invention concerne une composition de résine photosensible qui contient au moins (A) un polymère hydrophobe qui est obtenu à partir d'un latex dispersé dans l'eau, (B) un polymère hydrophile, (C) un composé insaturé photopolymérisable, (D) un initiateur de photopolymérisation et si nécessaire (E) un caoutchouc. Cette composition de résine photosensible est caractérisée en ce que le composé insaturé photopolymérisable (C) est formé de (C-1) un oligomère photopolymérisable qui ne contient pas de groupe hydroxyle, (C-2) un monomère photopolymérisable à groupe hydroxyle qui a un squelette de pentaérythritol, un squelette de dipentaérythritol ou un squelette de glycérol, et si nécessaire (C-3) un monomère photopolymérisable qui ne contient pas de groupe hydroxyle. On préfère que la teneur du monomère photopolymérisable à teneur en groupe hydroxyle (C-2) soit 1-20 % en masse de la composition de résine photosensible et que la teneur en caoutchouc (E) soit 0,5-15 % en masse de la composition de résine photosensible.
(JA)  従来通りの耐刷性、画像再現性、現像性を保持しつつ、印刷カスレの発生しないCTP感光性フレキソ印刷原版を提供する。本発明は、少なくとも(A)水分散ラテックスから得られる疎水性重合体、(B)親水性重合体、(C)光重合性不飽和化合物、(D)光重合開始剤、及び必要により(E)ゴムを含む感光性樹脂組成物であって、(C)光重合性不飽和化合物が、(C-1)水酸基非含有光重合性オリゴマー、(C-2)ペンタエリスリトール骨格、ジペンタエリスリトール骨格又はグリセリン骨格を持つ水酸基含有光重合性モノマー、及び所望により(C-3)水酸基非含有光重合性モノマーからなることを特徴とする。(C-2)水酸基含有光重合性モノマーの含有量は感光性樹脂組成物の1~20質量%であり、(E)ゴムの含有量は感光性樹脂組成物の0.5~15質量%であることが好ましい。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)