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1. (WO2013145955) METHOD AND APPARATUS FOR PRODUCING FLUORINE GAS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/145955    International Application No.:    PCT/JP2013/054178
Publication Date: 03.10.2013 International Filing Date: 20.02.2013
IPC:
C01B 7/20 (2006.01)
Applicants: CENTRAL GLASS COMPANY, LIMITED [JP/JP]; 5253, Oaza Okiube, Ube-shi, Yamaguchi 7550001 (JP)
Inventors: MORI, Isamu; (JP).
YAO, Akifumi; (JP).
KITA, Takuya; (JP).
UMEZAKI, Tomonori; (JP).
MIYAZAKI, Tatsuo; (JP)
Agent: KOBAYASHI, Hiromichi; c/o Shiga Patent Office, Ekisaikai Bldg., 1-29, Akashi-cho, Chuo-ku, Tokyo 1040044 (JP)
Priority Data:
2012-072680 28.03.2012 JP
Title (EN) METHOD AND APPARATUS FOR PRODUCING FLUORINE GAS
(FR) PROCÉDÉ ET APPAREIL DE FABRICATION DE FLUOR GAZEUX
(JA) フッ素ガスの製造方法とその装置
Abstract: front page image
(EN)Disclosed is a method for producing a fluorine gas, which comprises: a step [1] of exciting a higher fluorinated interhalogen compound gas (XFn: wherein X represents a halogen atom other than a fluorine atom; and n represents an integer of 3 to 7) to generate a fluorine gas and a lower fluorinated interhalogen compound gas (XFn-2: wherein X represents a halogen atom other than a fluorine atom; and n represents an integer of 3 to 7); and a step [2] of capturing the lower fluorinated interhalogen compound gas. The method enables a fluorine gas to be produced from a fluorinated interhalogen gas in a large amount and safely.
(FR)L'invention concerne un procédé de fabrication d'un fluor gazeux, qui comprend : une étape [1] d'excitation d'un gaz composite inter-halogène fluoré supérieur (XFn : dans lequel X représente un atome d'halogène autre qu'un atome de fluor ; et n représente un entier de 3 à 7) pour générer un fluor gazeux et un gaz composite inter-halogène fluoré inférieur (XFn-2 : dans lequel X représente un atome d'halogène autre qu'un atome de fluor ; et n représente un entier de 3 à 7) ; et une étape [2] de capture du gaz composite inter-halogène fluoré inférieur. La méthode permet la fabrication d'un fluor gazeux à partir d'un gaz inter-halogène fluoré en grande quantité et sans danger.
(JA) 開示されているのは、高次フッ素化ハロゲン間化合物ガス(XFn:Xはフッ素以外のハロゲン、nは3~7の整数)を励起し、フッ素ガスと低次フッ素化ハロゲン間化合物ガス(XFn-2:Xはフッ素以外のハロゲン、nは3~7の整数)を生成させる工程[1]と、前記低次フッ素化ハロゲン間化合物ガスを捕集する工程[2]と、を含む、フッ素ガスの製造方法である。この方法によって、フッ素化ハロゲン間化合物から大量かつ安全にフッ素ガスを製造できる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)