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|1. (WO2013145916) MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE|
|Applicants:||TOKYO ELECTRON LIMITED
|Title:||MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE|
A microwave radiation antenna (45) for irradiating microwaves propagated over a microwave propagation path into a chamber and generating a surface wave plasma has: an antenna unit (121) comprising a conductor; a plurality of slots (122) through which microwaves are irradiated, the slots (122) being provided in the antenna unit (121); and a plurality of gas discharge apertures (125) for discharging a processing gas into the chamber, the gas discharge apertures (125) being provided in the antenna unit (121). A dielectric layer (126) is provided so that a metallic surface wave is formed on a surface by the microwaves, a surface wave plasma is generated by the metallic surface wave, and at least a portion of the metallic surface of the antenna unit (121) is insulated in terms of direct current from the surface wave plasma.