Search International and National Patent Collections

1. (WO2013145916) MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE

Pub. No.:    WO/2013/145916    International Application No.:    PCT/JP2013/053583
Publication Date: Fri Oct 04 01:59:59 CEST 2013 International Filing Date: Fri Feb 15 00:59:59 CET 2013
IPC: H05H 1/46
H01L 21/3065
H01P 5/103
Applicants: TOKYO ELECTRON LIMITED
東京エレクトロン株式会社
Inventors: IKEDA Taro
池田 太郎
KOMATSU Tomohito
小松 智仁
KASAI Shigeru
河西 繁
NAKAGOMI Jun
中込 淳
Title: MICROWAVE IRRADIATING ANTENNA, MICROWAVE PLASMA SOURCE, AND PLASMA PROCESSING DEVICE
Abstract:
A microwave radiation antenna (45) for irradiating microwaves propagated over a microwave propagation path into a chamber and generating a surface wave plasma has: an antenna unit (121) comprising a conductor; a plurality of slots (122) through which microwaves are irradiated, the slots (122) being provided in the antenna unit (121); and a plurality of gas discharge apertures (125) for discharging a processing gas into the chamber, the gas discharge apertures (125) being provided in the antenna unit (121). A dielectric layer (126) is provided so that a metallic surface wave is formed on a surface by the microwaves, a surface wave plasma is generated by the metallic surface wave, and at least a portion of the metallic surface of the antenna unit (121) is insulated in terms of direct current from the surface wave plasma.