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1. (WO2013145540) INFRARED RADIATION ELEMENT AND METHOD FOR MANUFACTURING SAME

Pub. No.:    WO/2013/145540    International Application No.:    PCT/JP2013/001051
Publication Date: Fri Oct 04 01:59:59 CEST 2013 International Filing Date: Tue Feb 26 00:59:59 CET 2013
IPC: G01N 21/01
Applicants: PANASONIC CORPORATION
パナソニック株式会社
Inventors: KIRIHARA, Masao
桐原 昌男
TSUJI, Koji
辻 幸司
NAGATANI, Yoshiharu
永谷 吉祥
MATSUNAMI, Hirotaka
松浪 弘貴
Title: INFRARED RADIATION ELEMENT AND METHOD FOR MANUFACTURING SAME
Abstract:
This infrared radiation element is provided with a substrate, a thin film section that is provided on one surface side of the substrate, and a heat generating material layer that is provided on the thin film section side opposite to the substrate side. The infrared radiation element radiates infrared rays from the heat generating material layer when electricity is carried to the heat generating material layer. The substrate has an opening penetrating in the thickness direction, said opening exposing the thin film section surface on the side opposite to the heat generating material layer side. The thin film section is provided with: a diaphragm section, which isolates the opening and the heat generating material layer from each other; and a supporting section, which is provided on the circumference portion of the opening, said portion being on the one surface side of the substrate, and which supports the diaphragm section. The diaphragm section is provided with a concave section, which is concaved to the opening side. The concave section has a concave inner surface. The heat generating material layer is formed along the inner surface of the concave section.