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1. (WO2013145161) METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM

Pub. No.:    WO/2013/145161    International Application No.:    PCT/JP2012/058156
Publication Date: Fri Oct 04 01:59:59 CEST 2013 International Filing Date: Thu Mar 29 01:59:59 CEST 2012
IPC: C01G 9/02
C01B 13/08
C01F 5/02
C01G 11/00
Applicants: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
東芝三菱電機産業システム株式会社
SHIRAHATA Takahiro
白幡 孝洋
ORITA Hiroyuki
織田 容征
HIRAMATSU Takahiro
平松 孝浩
Inventors: SHIRAHATA Takahiro
白幡 孝洋
ORITA Hiroyuki
織田 容征
HIRAMATSU Takahiro
平松 孝浩
Title: METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM
Abstract:
The present invention provides a method that is for producing a metal oxide film and that can produce a metal oxide film having a low resistance at a low cost. In the method for producing a metal oxide film, a solution (7) containing an alkyl metal is misted at a substrate (1) disposed in a non-vacuum. Furthermore, when misting the solution (7), a dopant solution (5) containing a dopant comprising an inorganic compound is misted at the substrate (1).