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1. (WO2013145161) METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/145161    International Application No.:    PCT/JP2012/058156
Publication Date: 03.10.2013 International Filing Date: 28.03.2012
IPC:
C01G 9/02 (2006.01), C01B 13/08 (2006.01), C01F 5/02 (2006.01), C01G 11/00 (2006.01)
Applicants: TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION [JP/JP]; 13-16, Mita 3-chome, Minato-ku, Tokyo 1080073 (JP) (For All Designated States Except US).
SHIRAHATA Takahiro [JP/JP]; (JP) (For US Only).
ORITA Hiroyuki [JP/JP]; (JP) (For US Only).
HIRAMATSU Takahiro [JP/JP]; (JP) (For US Only)
Inventors: SHIRAHATA Takahiro; (JP).
ORITA Hiroyuki; (JP).
HIRAMATSU Takahiro; (JP)
Agent: YOSHITAKE Hidetoshi; 10th floor, Sumitomo-seimei OBP Plaza Bldg., 4-70, Shiromi 1-chome, Chuo-ku, Osaka-shi, Osaka 5400001 (JP)
Priority Data:
Title (EN) METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM
(FR) PROCÉDÉ DE PRODUCTION D'UN FILM D'OXYDE MÉTALLIQUE ET FILM AINSI OBTENU
(JA) 金属酸化膜の製造方法および金属酸化膜
Abstract: front page image
(EN)The present invention provides a method that is for producing a metal oxide film and that can produce a metal oxide film having a low resistance at a low cost. In the method for producing a metal oxide film, a solution (7) containing an alkyl metal is misted at a substrate (1) disposed in a non-vacuum. Furthermore, when misting the solution (7), a dopant solution (5) containing a dopant comprising an inorganic compound is misted at the substrate (1).
(FR)Cette invention concerne un procédé qui permet de produire un film d'oxyde métallique et qui peut donner un film d'oxyde métallique ayant une basse résistance, à faible coût. Dans le procédé de production d'un film d'oxyde métallique selon l'invention, une solution (7) contenant un métal alkylique est déposée sous forme de brouillard sur un substrat (1) placé dans un non-vide. En outre, lors du dépôt sous forme de brouillard de la solution (7), une solution dopante (5) contenant un dopant comprenant un composé inorganique est déposée sous forme de brouillard sur le substrat (1).
(JA) 本発明は、低コストにて低抵抗の金属酸化膜を作製することができる金属酸化膜の製造方法を提供する。そこで、本発明に係る金属酸化膜の製造方法では、アルキル金属を含む溶液(7)を、非真空下に配置された基板(1)に対して噴霧する。さらに、当該溶液(7)の噴霧の際に、基板(1)に対して、無機化合物から成るドーパントを含むドーパント溶液(5)を噴霧する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)