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1. WO2013143795 - PROCESSING STATION FOR PLANAR SUBSTRATES AND METHOD FOR PROCESSING PLANAR SUBSTRATES

Publication Number WO/2013/143795
Publication Date 03.10.2013
International Application No. PCT/EP2013/053655
International Filing Date 25.02.2013
IPC
H01L 21/677 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
677for conveying, e.g. between different work stations
CPC
H01L 21/67706
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67706Mechanical details, e.g. roller, belt
H01L 21/67715
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67703between different workstations
67715Changing the direction of the conveying path
H01L 21/67751
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; ; Apparatus not specifically provided for elsewhere
677for conveying, e.g. between different workstations
67739into and out of processing chamber
67751vertical transfer of a single workpiece
Applicants
  • JRT PHOTOVOLTAICS GMBH & CO. KG [DE]/[DE]
Inventors
  • REICHENBACH, Michael
  • BAU, Markus
Agents
  • RUFF, WILHELM, BEIER, DAUSTER & PARTNER
Priority Data
10 2012 205 249.630.03.2012DE
Publication Language German (DE)
Filing Language German (DE)
Designated States
Title
(DE) BEARBEITUNGSSTATION FÜR FLÄCHIGE SUBSTRATE UND VERFAHREN ZUM BEARBEITEN VON FLÄCHIGEN SUBSTRATEN
(EN) PROCESSING STATION FOR PLANAR SUBSTRATES AND METHOD FOR PROCESSING PLANAR SUBSTRATES
(FR) STATION DE TRAITEMENT DE SUBSTRATS PLANS ET PROCÉDÉ DE TRAITEMENT DE SUBSTRATS PLANS
Abstract
(DE)
Die Erfindung betrifft eine Bearbeitungsstation für flächige Substrate mit wenigstens zwei Bearbeitungseinheiten und wenigstens zwei parallel zueinander angeordneten Transportlinien für Substrate, wobei die beiden Bearbeitungseinheiten zwischen den beiden Transportlinien platziert sind und wobei Mittel zum Bewegen der Substrate von den Transportlinien zu den Bearbeitungseinheiten und zurück vorgesehen sind. Die Mittel zum Bewegen der Substrate weisen vier Lineartransporteinheiten mit jeweils wenigstens einer Substratauflage auf, wobei eine erste Lineartransporteinheit von der zweiten Transportlinie zu der ersten Bearbeitungseinheit führt, eine zweite Lineartransporteinheit von der ersten Transportlinie zu der ersten Bearbeitungseinheit führt, eine dritte Lineartransporteinheit von der ersten Transportlinie zu der zweiten Bearbeitungseinheit führt und eine vierte Lineartransporteinheit von der zweiten Transportlinie zu der zweiten Bearbeitungseinheit führt.
(EN)
The invention relates to a processing station for planar substrates, comprising at least two processing units and at least two transport lines for substrates, which transport lines are arranged parallel to each other, wherein the processing units are placed between the two transport lines and wherein means for moving the substrates from the transport lines to the processing units and back are provided. The means for moving the substrates have four linear transport units, each having at least one substrate support, wherein a first linear transport unit leads from the second transport line to the first processing unit, a second linear transport unit leads from the first transport line to the first processing unit, a third linear transport unit leads from the first transport line to the second processing unit, and a fourth linear transport unit leads from the second transport line to the second processing unit.
(FR)
La présente invention concerne une station de traitement pour des substrats plans comprenant au moins deux unités de traitement et deux lignes de transport pour substrats disposées parallèlement entre elles. Les deux unités de traitement sont placées entre les deux lignes de transport et des moyens de déplacement des substrats sont prévus pour déplacer des substrats depuis les lignes de transport vers les unités de traitement, et vice versa. Les moyens destinés à déplacer des substrats présentent quatre unités de transport linéaires comprenant chacune au moins un support de substrat. Une première unité de transport linéaire mène de la deuxième ligne de transport vers la première unité de traitement, une deuxième unité de transport linéaire mène de la première ligne de transport vers la première unité de traitement, une troisième unité de transport linéaire mène de la première ligne de transport vers la deuxième unité de traitement, et une quatrième unité de transport linéaire mène de la deuxième ligne de transport vers la deuxième unité de traitement.
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