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1. WO2013142956 - METHODS AND COMPOUNDS FOR PHOTO LEWIS ACID GENERATION AND USES THEREOF

Publication Number WO/2013/142956
Publication Date 03.10.2013
International Application No. PCT/CA2013/000214
International Filing Date 08.03.2013
IPC
C07F 5/00 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
5Compounds containing elements of Groups 3 or 13 of the Periodic System
C07B 47/00 2006.01
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
BGENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
47Formation or introduction of functional groups not provided for in groups C07B39/-C07B45/126
C08J 3/24 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
3Processes of treating or compounding macromolecular substances
24Crosslinking, e.g. vulcanising, of macromolecules
C08J 5/18 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H142
5Manufacture of articles or shaped materials containing macromolecular substances
18Manufacture of films or sheets
C08K 5/03 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUSE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5Use of organic ingredients
02Halogenated hydrocarbons
03aromatic
C08K 5/375 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
KUSE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES AS COMPOUNDING INGREDIENTS
5Use of organic ingredients
36Sulfur-, selenium-, or tellurium-containing compounds
372Sulfides
375containing six-membered aromatic rings
CPC
C07F 1/02
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
1Compounds containing elements of Groups 1 or 11 of the Periodic System
02Lithium compounds
C07F 5/027
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
5Compounds containing elements of Groups 3 or 13 of the Periodic System
02Boron compounds
027Organoboranes and organoborohydrides
C07F 7/0829
CCHEMISTRY; METALLURGY
07ORGANIC CHEMISTRY
FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
7Compounds containing elements of Groups 4 or 14 of the Periodic System
02Silicon compounds
08Compounds having one or more C—Si linkages
0803Compounds with Si-C or Si-Si linkages
0825Preparations of compounds not comprising Si-Si or Si-cyano linkages
0827Syntheses with formation of a Si-C bond
0829Hydrosilylation reactions
C08G 77/08
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
77Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
04Polysiloxanes
06Preparatory processes
08characterised by the catalysts used
Applicants
  • UTI LIMITED PARTNERSHIP [CA]/[CA]
Inventors
  • PIERS, Warren Edward
  • KHALIMON, Andrey Yur'evich
  • VON MARWITZ, Adam John
Agents
  • HILL & SCHUMACHER
Priority Data
61/616,58028.03.2012US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHODS AND COMPOUNDS FOR PHOTO LEWIS ACID GENERATION AND USES THEREOF
(FR) PROCÉDÉS ET COMPOSÉS POUR LA PHOTOGÉNÉRATION D'ACIDES DE LEWIS ET LEURS UTILISATIONS
Abstract
(EN)
There are disclosed masked Lewis acids into compounds in which the Lewis acid can be released by exposure of the compound to light, especially ultraviolet light. These compounds can be represented by the following formula (I): ([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I). wherein briefly, E represents boron or aluminium, X is an aryl group and Y is -Ar'EAX,. These compounds are used as catalyst for hydrosilylation reaction, crosslinking of polymers, or ester deprotection reactions as photo Lewis acid generator (PhLAG).
(FR)
L'invention porte sur des acides de Lewis masqués sous la forme de composés, l'acide de Lewis pouvant être libéré par exposition du composé à de la lumière, en particulier de la lumière ultraviolette. Ces composés peuvent être représentés par la formule (I) suivante : ([(AEX(3-n))(n+1)Yn](n+1)-)m(Qm+)(n+1) (I). Dans la formule, en bref, E représente le bore ou l'aluminium, X représente un groupe aryle et Y représente -Ar'EAX. Ces composés sont utilisés comme catalyseur pour une réaction d'hydrosilylation, la réticulation de polymères ou des réactions de déprotection d'ester en tant que photogénérateur d'acide de Lewis (PhLAG).
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