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1. (WO2013125445) ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/125445    International Application No.:    PCT/JP2013/053558
Publication Date: 29.08.2013 International Filing Date: 14.02.2013
IPC:
H01L 21/304 (2006.01), B24B 37/00 (2012.01)
Applicants: HITACHI CHEMICAL COMPANY, LTD. [JP/JP]; 9-2, Marunouchi 1-chome, Chiyoda-ku, Tokyo 1006606 (JP)
Inventors: MINAMI Hisataka; (JP).
AKUTSU Toshiaki; (JP).
IWANO Tomohiro; (JP).
FUJISAKI Koji; (JP)
Agent: HASEGAWA Yoshiki; SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA (Meiji Yasuda Life Bldg.) 9th fl., 1-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1000005 (JP)
Priority Data:
2012-035439 21.02.2012 JP
Title (EN) ABRASIVE, ABRASIVE SET, AND METHOD FOR ABRADING SUBSTRATE
(FR) ABRASIF, ENSEMBLE ABRASIF ET PROCÉDÉ D'ABRASION D'UN SUBSTRAT
(JA) 研磨剤、研磨剤セット及び基体の研磨方法
Abstract: front page image
(EN)This abrasive contains: water; an abrasive grit including a hydroxide of a tetravalent metallic element; and a specific glycerin compound.
(FR)La présente invention concerne un abrasif qui contient : de l'eau ; un grain abrasif contenant l'hydroxyde d'un élément métallique tétravalent ; et un composé de glycérine spécifique.
(JA) 本発明に係る研磨剤は、水と、4価金属元素の水酸化物を含む砥粒と、特定のグリセリン化合物と、を含有する。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)