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1. (WO2013125289) EXPOSURE DRAWING DEVICE AND EXPOSURE DRAWING METHOD

Pub. No.:    WO/2013/125289    International Application No.:    PCT/JP2013/051481
Publication Date: Fri Aug 30 01:59:59 CEST 2013 International Filing Date: Fri Jan 25 00:59:59 CET 2013
IPC: H01L 21/027
G03F 7/20
H01L 21/68
Applicants: ADTEC Engineering Co., Ltd.
株式会社アドテックエンジニアリング
Inventors: HASHIGUCHI, Akihiro
橋口 昭浩
KIKUCHI, Hiroaki
菊池 浩明
YOSHIKAWA, Takeshi
吉川 武志
Title: EXPOSURE DRAWING DEVICE AND EXPOSURE DRAWING METHOD
Abstract:
Provided are an exposure drawing device and an exposure drawing method in which it is possible to identify the dust level in the exposure device during an exposure process performed on each substrate to be exposed. This invention is provided with: an exposure means for exposing a substrate to be exposed and thereby drawing a circuit pattern; a counting means for counting the number of microparticles in the exposure drawing device; a determining means for determining whether or not the number of particles counted by the counting means during the exposure process performed by the exposure means is equal to or greater than a threshold value defined on the basis of a size pertaining to the pattern of the circuit pattern; and an adding means for adding information defined in advance with respect to the substrate to be exposed, when it has been determined by the determining means that the number of particles is equal to or greater than the threshold value.