Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2013123590) RADIATION SOURCE CLEANING SYSTEM AND MODULE CONTAINING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/123590 International Application No.: PCT/CA2013/000171
Publication Date: 29.08.2013 International Filing Date: 25.02.2013
IPC:
B08B 3/04 (2006.01) ,C02F 1/30 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
08
CLEANING
B
CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
3
Cleaning by methods involving the use or presence of liquid or steam
04
Cleaning involving contact with liquid
C CHEMISTRY; METALLURGY
02
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
F
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
1
Treatment of water, waste water, or sewage
30
by irradiation
Applicants:
TROJAN TECHNOLOGIES [CA/CA]; 3020 Gore Road London, Ontario N5V 4T7, CA
Inventors:
BARKER, Jeffrey Thomas; CA
FROM, Wesley; CA
KAMBULOW, Ed; CA
Agent:
GOWLING LAFELUR HENDERSON LLP; 100 King Street West 1 First Canadian Place, Suite 1600 Toronto, Ontario M5X 1G5, CA
Priority Data:
61/634,07423.02.2012US
Title (EN) RADIATION SOURCE CLEANING SYSTEM AND MODULE CONTAINING SAME
(FR) SYSTÈME DE NETTOYAGE DE SOURCE DE RAYONNEMENT ET MODULE CONTENANT CELUI-CI
Abstract:
(EN) There is described a cleaning system for a radiation source. The cleaning system comprises: (i) a cleaning chamber housing; (ii) a cleaning cartridge removably disposed in the cleaning chamber housing; and (iii) an endcap element removably coupled to the cleaning chamber housing. The cleaning cartridge comprises a first sealing element and a second sealing element, the first sealing element and the second sealing element configured to provide a substantially fluid tight seal with respect to an exterior surface of the radiation source. A radiation source module and a fluid treatment system comprising the radiation source module are also described.
(FR) L'invention concerne un système de nettoyage pour une source de rayonnement. Le système de nettoyage comprend : (i) un logement de chambre de nettoyage ; (ii) une cartouche de nettoyage disposée de façon amovible dans le logement de chambre de nettoyage ; et (iii) un élément d'embout accouplé de façon amovible au logement de chambre de nettoyage. La cartouche de nettoyage comprend un premier élément d'étanchéité et un second élément d'étanchéité, le premier élément d'étanchéité et le second élément d'étanchéité étant conçus pour fournir un joint sensiblement étanche par rapport à une surface extérieure de la source de rayonnement. L'invention concerne également un module de source de rayonnement et un système de traitement de fluide comprenant le module de source de rayonnement.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)