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1. (WO2013123059) METHOD AND APPARATUS FOR REPAIRING A MITRAL VALVE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/123059 International Application No.: PCT/US2013/025951
Publication Date: 22.08.2013 International Filing Date: 13.02.2013
IPC:
A61F 2/24 (2006.01)
Applicants: MITRASPAN, INC[US/US]; 23 Locust St. Belmont, MA 02478, US
Inventors: ROURKE, Jonathan, M.; US
KYI, Stanley, B.; US
Agent: PANDISCIO, Mark, J.; Pandiscio & Pandiscio 436 Boston Post Road Weston, MA 02493, US
Priority Data:
61/598,04713.02.2012US
61/740,90121.12.2012US
Title (EN) METHOD AND APPARATUS FOR REPAIRING A MITRAL VALVE
(FR) PROCÉDÉ ET APPAREIL DE RÉPARATION D'UNE VALVULE MITRALE
Abstract: front page image
(EN) A method for repairing a mitral valve, the method comprising: positioning a crossing guidewire across the mitral valve, the crossing guidewire passing through the annulus of the mitral valve at a first location and passing through the annulus of the mitral valve at a second location; using the crossing guidewire to position a spanning implant across the mitral valve, with the spanning implant extending from the first location to the second location; anchoring the spanning implant at the first location; tensioning the spanning implant so as to draw the first location and the second location together; and anchoring the spanning implant at the second location.
(FR) L'invention concerne un procédé de réparation d'une valvule mitrale, le procédé comprenant : le positionnement d'un fil-guide transversal à travers la valvule mitrale, le fil-guide transversal passant à travers l'anneau de la valvule mitrale à un premier emplacement et passant à travers l'anneau de la valvule mitrale à un second emplacement ; l'utilisation du fil-guide transversal pour positionner un implant d'écartement à travers la valvule mitrale, l'implant chevauchant s'étendant du premier emplacement au second emplacement ; l'ancrage de l'implant d'écartement au premier emplacement ; la mise en tension de l'implant d'écartement de façon à rapprocher le premier emplacement et le second emplacement; et l'ancrage de l'implant d'écartement au second emplacement.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)