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1. (WO2013122954) LINEAR PECVD APPARATUS

Pub. No.:    WO/2013/122954    International Application No.:    PCT/US2013/025771
Publication Date: Fri Aug 23 01:59:59 CEST 2013 International Filing Date: Wed Feb 13 00:59:59 CET 2013
IPC: C23C 16/50
C23C 16/455
Applicants: APPLIED MATERIALS, INC.
KUDELA, Jozef
ANWAR, Suhail
SORENSEN, Carl, A.
TRUONG, Douglas
WHITE, John, M.
Inventors: KUDELA, Jozef
ANWAR, Suhail
SORENSEN, Carl, A.
TRUONG, Douglas
WHITE, John, M.
Title: LINEAR PECVD APPARATUS
Abstract:
The present invention generally relates to a linear PECVD apparatus. The apparatus is designed to process two substrates simultaneously so that the substrates share plasma sources as well as gas sources. The apparatus has a plurality of microwave sources centrally disposed within the chamber body of the apparatus. The substrates are disposed on opposite sides of the microwave sources with the gas sources disposed between the microwave sources and the substrates. The shared microwave sources and gas sources permit multiple substrates to be processed simultaneously and reduce the processing cost per substrate.