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1. (WO2013122590) APPARATUS AND METHODS OF SKIN EFFECT CORRECTION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/122590 International Application No.: PCT/US2012/025477
Publication Date: 22.08.2013 International Filing Date: 16.02.2012
Chapter 2 Demand Filed: 12.12.2013
IPC:
G01V 3/28 (2006.01) ,G01V 3/26 (2006.01)
G PHYSICS
01
MEASURING; TESTING
V
GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
3
Electric or magnetic prospecting or detecting; Measuring magnetic field characteristics of the earth, e.g. declination or deviation
18
specially adapted for well-logging
26
operating with magnetic or electric fields produced or modified either by the surrounding earth formation or by the detecting device
28
using induction coils
G PHYSICS
01
MEASURING; TESTING
V
GEOPHYSICS; GRAVITATIONAL MEASUREMENTS; DETECTING MASSES OR OBJECTS; TAGS
3
Electric or magnetic prospecting or detecting; Measuring magnetic field characteristics of the earth, e.g. declination or deviation
18
specially adapted for well-logging
26
operating with magnetic or electric fields produced or modified either by the surrounding earth formation or by the detecting device
Applicants:
HOU, Junsheng [CN/US]; US (UsOnly)
SAN MARTIN, Luis, E. [US/US]; US (UsOnly)
HALLIBURTON ENERGY SERVICES, INC. [US/US]; 10200 Bellaire Boulevard Houston, TX 77072, US (AllExceptUS)
Inventors:
HOU, Junsheng; US
SAN MARTIN, Luis, E.; US
Agent:
MADDEN, Robert, B.; Schwegman, Lundberg & Woessner, PA P.O. Box 2938 Minneapolis, MN 55402, US
Priority Data:
Title (EN) APPARATUS AND METHODS OF SKIN EFFECT CORRECTION
(FR) APPAREIL ET PROCÉDÉS POUR LA CORRECTION D'UN EFFET PARIÉTAL
Abstract:
(EN) Various embodiments include apparatus and methods to provide a skin- effect correction. The skin-effect correction can be based on a pre-calculated correction coefficient library. In various embodiments, a skin-effect correction procedure can be applied that only uses a single-frequency R-signal measurement. In addition, an embodiment of a skin-effect correction procedure using a single- frequency R-signal measurement can be applied whenever the quality of the data from one of the multiple frequencies normally used in a multi- frequency method is reliable. Additional apparatus, systems, and methods are disclosed.
(FR) La présente invention concerne, selon divers modes de réalisation, un appareil et des procédés permettant de corriger un effet pariétal. La correction de l'effet pariétal peut se baser sur une bibliothèque de coefficients de correction préalablement calculés. Dans divers modes de réalisation, une procédure de correction d'effet pariétal qui utilise uniquement une mesure d'un signal R à fréquence unique peut être appliquée. En outre, un mode de réalisation d'une procédure de correction d'un effet pariétal utilisant une mesure d'un signal R à fréquence unique peut être appliqué chaque fois que la qualité des données provenant de l'une des nombreuses fréquences normalement utilisées dans un procédé à fréquences multiples est fiable. La présente invention concerne un appareil, des systèmes et des procédés supplémentaires.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)