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1. (WO2013120052) PREPARATION, PURIFICATION AND USE OF HIGH-X DIBLOCK COPOLYMERS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/120052    International Application No.:    PCT/US2013/025510
Publication Date: 15.08.2013 International Filing Date: 11.02.2013
IPC:
C08J 7/12 (2006.01), B82Y 10/00 (2011.01), B82Y 40/00 (2011.01), C08J 3/28 (2006.01), C08L 53/00 (2006.01)
Applicants: E. I. DU PONT DE NEMOURS AND COMPANY [US/US]; 1007 Market Street Wilmington, Delaware 19898 (US).
MASSACHUSETTS INSTITUTE OF TECHNOLOGY [US/US]; 77 Massachusetts Avenue Cambridge, Massachusetts 02139 (US)
Inventors: BERGGREN, Karl, K.; (US).
FARNHAM, William, Brown; (US).
FEDYNYSHYN, Theodore, H.; (US).
NICAISE, Samuel, M.; (US).
SHEEHAN, Michael, Thomas; (US).
TRAN VI, Hoang; (US)
Agent: KAEDING, Konrad, S.; E. I. du Pont de Nemours and Company Legal Patent Records Center 4417 Lancaster Pike Wilmington, Delaware 19805 (US)
Priority Data:
61/597,558 10.02.2012 US
Title (EN) PREPARATION, PURIFICATION AND USE OF HIGH-X DIBLOCK COPOLYMERS
(FR) PRÉPARATION, PURIFICATION ET UTILISATION DE COPOLYMÈRES À DEUX BLOCS À Χ ÉLEVÉ
Abstract: front page image
(EN)This invention relates to the preparation and purification of high-X ("chi") diblock copolymers. Such copolymers contain two segments ("blocks") of polymers with significantly different interaction parameters and can be used in directed self-assembly applications.
(FR)Cette invention concerne la préparation et la purification de copolymères à deux blocs à χ(« khi ») élevé. De tels copolymères contiennent deux segments (« blocs ») de polymères ayant des paramètres d'interaction significativement différents et peuvent être utilisés dans des applications d'autoassemblage dirigé.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)