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1. (WO2013119546) PHOTOCURABLE COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/119546 International Application No.: PCT/US2013/024737
Publication Date: 15.08.2013 International Filing Date: 05.02.2013
Chapter 2 Demand Filed: 21.11.2013
IPC:
G03F 7/075 (2006.01)
Applicants: 3M INNOVATIVE PROPERTIES COMPANY[US/US]; 3M Center Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US
Inventors: QIU, Zai-Ming; US
FALL, Douglas C.; US
Agent: KOKKO, Kent S.; 3M Center Office of Intellectual Property Counsel Post Office Box 33427 Saint Paul, Minnesota 55133-3427, US
Priority Data:
13/370,76710.02.2012US
Title (EN) PHOTOCURABLE COMPOSITION
(FR) COMPOSITION PHOTODURCISSABLE
Abstract:
(EN) A low surface energy photoresist composition is described that comprises a silicone-polyether block copolymer, wherein the silicone block comprises 35 wt.% or more of said copolymer. When compounded with a photoresist composition, the composition enables the release of a phototool from the photoresist layer.
(FR) La présente invention concerne une composition de résine photosensible à énergie superficielle basse, la composition contenant un copolymère séquencé de silicone-polyéther et la séquence de silicone représentant 35 % en poids ou plus dudit copolymère. Quand elle est mélangée avec une composition de résine photosensible, la composition permet l'obtention d'un masque photographique à partir de la couche de résine photosensible.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)