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1. (WO2013118442) THIN-FILM LAMINATE

Pub. No.:    WO/2013/118442    International Application No.:    PCT/JP2013/000383
Publication Date: Fri Aug 16 01:59:59 CEST 2013 International Filing Date: Sat Jan 26 00:59:59 CET 2013
IPC: B32B 9/04
C08J 7/04
Applicants: NIPPON SODA CO., LTD.
日本曹達株式会社
Inventors: SHIBATA, Hiromoto
芝田 大幹
KUMAZAWA, Kazuhisa
熊澤 和久
KIMURA, Nobuo
木村 信夫
Title: THIN-FILM LAMINATE
Abstract:
This thin-film laminate has a first layer and a second layer formed on a resin substrate in the sequence listed, the thin-film laminate characterized in that: the first layer is an organic-inorganic composite thin film having a film thickness no less than 500 nm and containing a) a condensate of an organic silicon compound represented by RnSiX4-n and b) an organic polymeric compound; the second layer is either a) a metal oxide thin film that has a film thickness no greater than 200 nm and that is formed by the sol-gel process, the film thickness variation of the metal oxide thin film, represented by [film thickness variation [%] = 100 × (standard deviation of film thickness)/(average film thickness)] being less than 10%, or b) a gas barrier film having a film thickness no greater than 500 nm; the first layer has, on the side of the interface with the second layer, a layer in which the condensate of the organic silicon compound has concentrated; and the concentration of carbon atoms in the concentrated layer is 20%, or over 20%, less than the concentration of carbon atoms in the first layer at a depth of 300 nm from the interface between the first layer and the second layer.