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1. (WO2013118397) FILM FORMING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/118397 International Application No.: PCT/JP2012/082927
Publication Date: 15.08.2013 International Filing Date: 19.12.2012
IPC:
C23C 14/24 (2006.01) ,C23C 14/04 (2006.01) ,H01L 51/50 (2006.01) ,H05B 33/10 (2006.01)
Applicants: TOKYO ELECTRON LIMITED[JP/JP]; 3-1, Akasaka 5-chome, Minato-ku, Tokyo 1076325, JP
Inventors: KITAHARA, Toshifumi; JP
Agent: IMY INTERNATIONAL PATENT OFFICE, P.C.; Oriental Sakaisuji Bldg., 21-19, Shimanouchi 1-chome, Chuo-ku, Osaka-shi, Osaka 5420082, JP
Priority Data:
2012-02478508.02.2012JP
Title (EN) FILM FORMING APPARATUS
(FR) APPAREIL DE FORMATION DE FILM
(JA) 成膜装置
Abstract: front page image
(EN) A film forming apparatus (21) forms a film on a substrate to be processed (11), on the surface of which a patterned mask member (14) is fitted. The film forming apparatus (21) is provided with: a processing chamber (33) which is capable of internally containing the substrate to be processed (11); a vapor deposition mechanism for performing vapor deposition on a surface of the substrate to be processed (11), on said surface the mask member (14) being fitted; and a cooling mechanism (40) for cooling the mask member (14). The cooling mechanism (40) comprises a cooling member which is capable of cooling the mask member (14) at a position apart from the mask member (14).
(FR) L'invention concerne un appareil de formation de film (21) qui forme un film sur un substrat à traiter (11), à la surface duquel est disposé un élément de masque (14) gravé. L'appareil de formation de film (21) comprend : une enceinte de traitement (33) qui est apte à contenir à l'intérieur le substrat à traiter (11) ; un mécanisme de dépôt en phase vapeur destiné à réaliser un dépôt en phase vapeur sur une surface du substrat à traiter (11), l'élément de masque (14) étant disposé sur ladite surface ; et un mécanisme de refroidissement (40) destiné à refroidir l'élément de masque (14). Le mécanisme de refroidissement (40) comprend un élément de refroidissement qui est apte à refroidir l'élément de masque (14) à partir d'une position éloignée de l'élément de masque (14).
(JA)  成膜装置(21)は、パターンが形成されたマスク部材(14)をその表面に取り付けた被処理基板(11)に対して成膜を行う。成膜装置(21)は、その内部に被処理基板(11)を収容可能な処理室(33)と、被処理基板(11)のうちのマスク部材(14)が取り付けられた面に対する蒸着を行う蒸着機構と、マスク部材(14)を冷却する冷却機構(40)とを備える。冷却機構(40)は、マスク部材(14)と離隔した位置でマスク部材(14)を冷却可能な冷却部材を含む。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)