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1. (WO2013118015) CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN

Pub. No.:    WO/2013/118015    International Application No.:    PCT/IB2013/050647
Publication Date: Fri Aug 16 01:59:59 CEST 2013 International Filing Date: Sat Jan 26 00:59:59 CET 2013
IPC: H01L 21/304
H01L 21/302
H01L 21/463
H01L 21/461
Applicants: BASF SE
BASF (CHINA) COMPANY LIMITED
BASF SCHWEIZ AG
Inventors: LI, Yuzhuo
NOLLER, Bastian Marten
LAUTER, Michael
LANGE, Roland
Title: CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN
Abstract:
Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.