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1. (WO2013118013) A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/118013 International Application No.: PCT/IB2013/050625
Publication Date: 15.08.2013 International Filing Date: 24.01.2013
IPC:
C11D 7/22 (2006.01) ,H01L 21/02 (2006.01)
C CHEMISTRY; METALLURGY
11
ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
D
DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
7
Compositions of detergents based essentially on non-surface-active compounds
22
Organic compounds
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
Applicants:
BASF SE [DE/DE]; 67056 Ludwigshafen, DE
BASF (CHINA) COMPANY LIMITED [CN/CN]; 300 Jiangxinsha Road Shanghai, 200137, CN (MN)
BASF SCHWEIZ AG; Klybeckstrasse 141 CH-4057 Basel, CH (CY)
Inventors:
LI, Yuzhuo; DE
VENKATARAMAN, Shyam Sundar; DE
ZHONG, Mingjie; US
Common
Representative:
BASF SE; 67056 Ludwigshafen, DE
Priority Data:
61/595,18006.02.2012US
Title (EN) A POST CHEMICAL-MECHANICAL-POLISHING (POST-CMP) CLEANING COMPOSITION COMPRISING A SPECIFIC SULFUR-CONTAINING COMPOUND AND A SUGAR ALCOHOL OR A POLYCARBOXYLIC ACID
(FR) COMPOSITION DE NETTOYAGE DE TYPE POST-POLISSAGE MÉCANO-CHIMIQUE (POST-CMP) COMPRENANT UN COMPOSÉ SPÉCIFIQUE CONTENANT DU SOUFRE ET UN ALCOOL DE SUCRE OU UN ACIDE POLYCARBOXYLIQUE
Abstract:
(EN) A post chemical-mechanical-polishing (post-CMP) cleaning composition comprising: (A) at least one compound comprising at least one thiol (–SH), thioether (–SR1 ) or thiocarbonyl (>C=S) group, wherein R1 is alkyl, aryl, alkylaryl or arylalkyl, (B) at least one sugar alcohol which contains at least three hydroxyl (–OH) groups and does not comprise any carboxylic acid (–COOH) or carboxylate (–COO -) groups, and (C)an aqueous medium.
(FR) Cette invention concerne une composition de nettoyage de type post-polissage mécano-chimique (post-CMP) comprenant : (A) au moins un composé contenant au moins un groupe thiol (-SH), thioéther (-SR) ou thiocarbonyle (>C=S), R étant un alkyle, un aryle, un alkylaryle ou un arylalkyle, (B) au moins un alcool de sucre qui contient au moins trois groupes hydroxyle (-OH) et est dépourvu de tout groupe acide carboxylique (-COOH) ou carboxylate (-COO-), et (C) un milieu aqueux.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)