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Machine translation
1. (WO2013115590) SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/115590    International Application No.:    PCT/KR2013/000823
Publication Date: 08.08.2013 International Filing Date: 01.02.2013
IPC:
H01L 21/205 (2006.01), H01L 21/3065 (2006.01)
Applicants: JUSUNG ENGINEERING CO., LTD. [KR/KR]; 240, Opo-ro, Opo-eup, Gwangju-si Gyeonggi-do 464-892 (KR)
Inventors: HWANG, Chul Joo; (KR).
KIM, Young Rok; (KR)
Agent: ASTRAN INT'L IP GROUP; (ShinSung Building, Yeoksam-dong) 5th Floor, 233, Yeoksam-ro, Gangnam-gu, Seoul 135-514 (KR)
Priority Data:
10-2012-0011489 03.02.2012 KR
Title (EN) SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
(FR) APPAREIL DE TRAITEMENT DE SUBSTRATS ET PROCÉDÉ DE TRAITEMENT DE SUBSTRATS
(KO) 기판 처리 장치 및 기판 처리 방법
Abstract: front page image
(EN)The present invention relates to a substrate processing apparatus and a substrate processing method which can increase the uniformity of deposition of a thin film deposited on a substrate. In order to achieve the aforementioned technical matter, the substrate processing apparatus according to the present invention comprises: a process chamber; a substrate support part provided at the process chamber for supporting at least one substrate; a chamber lid which covers the upper part of the process chamber so as to face the substrate support part; and a gas spraying part which is radially provided at the chamber lid to locally face the substrate support part and has multiple gas spraying modules which locally spray at least one type of gas onto the substrate support part, wherein at least one gas spraying module of the multiple gas spraying modules activates and sprays the at least one type of gas.
(FR)La présente invention concerne un appareil de traitement de substrats et un procédé de traitement de substrats permettant d'augmenter l'uniformité de dépôt d'un film mince déposé sur un substrat. L'appareil de traitement de substrats selon la présente invention comprend ainsi une chambre de traitement, un support de substrat, un couvercle de chambre, et un diffuseur de gaz. Le support de substrat est disposé dans la chambre de traitement de façon à supporter au moins un substrat. Le couvercle de chambre couvre la partie supérieure de la chambre de traitement de façon à faire face au support de substrat. Le diffuseur de gaz est disposé radialement sur le couvercle de la chambre de façon à faire face localement au support de substrat. Ce diffuseur de gaz est constitué de plusieurs modules de diffusion de gaz qui diffusent localement au moins un type de gaz sur le support de substrat. L'un au moins des modules de diffusion de gaz de la pluralité de modules de diffusion de gaz rend actif le type de gaz considéré et le diffuse.
(KO)본 발명은 기판에 증착되는 박막의 증착 균일도를 증가시킬 수 있도록 한 기판 처리 장치 및 기판 처리 방법에 관한 것으로, 전술한 기술적 과제를 달성하기 위한 본 발명에 따른 기판 처리 장치는 공정 챔버; 상기 공정 챔버에 설치되어 적어도 하나의 기판을 지지하는 기판 지지부; 상기 기판 지지부에 대향되도록 상기 공정 챔버의 상부를 덮는 챔버 리드; 및 상기 챔버 리드에 방사 형태로 설치되어 상기 기판 지지부에 국부적으로 대향되며, 적어도 한 종류의 가스를 상기 기판 지지부 상에 국부적으로 분사하는 복수의 가스 분사 모듈을 가지는 가스 분사부를 포함하고, 상기 복수의 가스 분사 모듈 중 적어도 하나의 가스 분사 모듈은 상기 적어도 한 종류의 가스를 활성화시켜 분사하는 것을 특징으로 한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)