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|1. (WO2013114870) PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD|
|Applicants:||TOKYO ELECTRON LIMITED
|Title:||PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD|
[Problem] To precisely suppress fluctuation and unevenness in a plasma process in one-time sheet plasma processing. [Solution] An OES measurement unit (110) outputs a spectroscopic measurement value (MOESi) at, or immediately after, the completion of each step. A CD estimation unit (140) uses the spectroscopic measurement value (MOESi) and a CD estimation model (AMi), introduced from an estimation model storage unit (142), to find a CD estimation value (ACDi) for each step. In the automatic control of a subject (130) to be controlled, a process control unit (132) uses, for the next step, the CD estimation value (ACDi) for the previous step, taken from the CD estimation unit (140), in addition to a process condition setting value (PCi+1), for the next-step, introduced from a recipe storage unit (136), and a process control model (CMi+1), for the next step, introduced from a control model storage unit (138).