WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2013113634) LITHOGRAPHIC APPARATUS COMPONENT AND LITHOGRAPHIC APPARATUS
Note: Text based on automatic Optical Character Recognition processes. Please use the PDF version for legal matters

WHAT IS CLAIMED IS:

1. A lithographic apparatus component wherein said component is provided with channels for providing a temperature control medium to the component.

2. Apparatus as claimed in claim 1 wherein the medium is a two phase medium and the channel functions as a heat pipe.

3. Apparatus as claimed in claim 2 wherein the two phase medium is carbon dioxide.

4. Apparatus as claimed in claim 1 wherein at least some of the channels are provided near to a surface of the component.

5. Apparatus as claimed in claim 1 or 2 wherein the channels are provided parallel to a surface of the component.

6. Apparatus as claimed in any of claims 1 to 3 wherein the channels are grouped together in channel groups, each group being provided with its own temperature control system.

7. Apparatus as claimed in any of claims 1 to 4 wherein said apparatus is provided with a deformation measurement system.

8. Apparatus as claimed in claim 5 wherein the deformation measurement system comprises:

a capacitive sensor comprising a first electrode provided to a first portion of the apparatus frame and a second electrode to a second portion of the apparatus,

wherein the capacitive sensor determines a displacement between the electrodes to determine the deformation of the apparatus.

9. Apparatus as claimed in claim 5 wherein the deformation measurement system is provided with an interferometer for measuring a deformation.

10. Apparatus as claimed in any of claims 5 to 7, wherein the apparatus is provided with a deformation controller operably connected to the deformation measurement system and the temperature control system is a pressure control system constructed and programmed to adjust a pressure of the two phase medium in a group of channels such as to adjust a temperature of the group of channels as a function of the measured deformation by the deformation measurement system.

11. Apparatus as claimed in any of claims 5 to 8 wherein the component is formed of a metal.

12. Apparatus as claimed in any of claims 1 to 9 wherein the component is an optical element.

13. Apparatus as claimed in claim 12 wherein said temperature control medium is provided only to those regions of said optical component used in image formation.

14. Apparatus as claimed in claim 10 wherein the optical element is a mirror.

15. Apparatus as claimed in claim 11 wherein the temperature control medium is supplied at different temperatures to respective channels to cause a controlled deformation of said mirror.

16. Apparatus as claimed in any of claims 1 to 4 wherein deformation of an optical element may be determined indirectly by determining optical parameters of an image and in the event of an error in such parameters being detected generating a correction signal that may be fed back to a temperature control system to make a correcting adjustment.

17. Apparatus as claimed in any of claims 1 to 14 comprising a 1 + n (n being an integer) two-phase fluid pressure control loops whereby deformation of the mirror is controlled with n degrees of freedom.

18. A lithographic apparatus including a component provided with channels for providing a temperature control medium to the component.

19. A lithographic apparatus as claimed in claim 18 wherein said component is an optical element and wherein deformation of an optical element may be determined indirectly by determining optical parameters of an image and in the event of an error in such parameters being detected generating a correction signal that may be fed back to a temperature control system to make a correcting adjustment.

20. A lithographic apparatus as claimed in claim 19 wherein said temperature control medium is provided only to those regions of said optical element used in image formation