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1. (WO2013113572) RADIATION CURABLE ETCH RESISTANT INKJET INK PRINTING

Pub. No.:    WO/2013/113572    International Application No.:    PCT/EP2013/050943
Publication Date: Fri Aug 09 01:59:59 CEST 2013 International Filing Date: Sat Jan 19 00:59:59 CET 2013
IPC: C09D 11/10
C23F 1/02
Applicants: AGFA-GEVAERT
Inventors: SMET, Stefaan
ZUTTERMAN, Freddy
VERMEERSCH, Peter
LOCCUFIER, Johan
WILLEMS, Ann
Title: RADIATION CURABLE ETCH RESISTANT INKJET INK PRINTING
Abstract:
The present invention is drawn towards methods of inkjet printing radiation curable inkjet inks forming a protective layer during an etching process, wherein the radiation curable inkjet ink includes at least 70 percent by weight of a polymerizable composition based on the total weight of radiation curable inkjet ink, wherein the polymerizable composition has an oxygen fraction OFR > 0.250 and a weighted polymerizable functionality WPF ≥ 0.0050, and wherein the polymerizable composition contains no polymerizable compound with an ethylenic double bond and including a phosphoester group or a carboxylic acid group in the molecule thereof.