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1. (WO2013112364) ALUMINUM COATED OR CERAMIC PARTS FOR SUBSTRATE DRIVE SYSTEM
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/112364    International Application No.:    PCT/US2013/022087
Publication Date: 01.08.2013 International Filing Date: 18.01.2013
IPC:
C23C 16/458 (2006.01), C23C 16/44 (2006.01), C23C 16/12 (2006.01), C23C 16/50 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US) (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IS, IT, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM, ZW only).
KURITA, Shinichi [JP/US]; (US) (US only).
JOHNSTON, Benjamin, M. [US/US]; (US) (US only)
Inventors: KURITA, Shinichi; (US).
JOHNSTON, Benjamin, M.; (US)
Agent: PATTERSON, B., Todd; Patterson & Sheridan, LLP 24 Greenway Plaza, Suite 1600 Houston, TX 77046 (US)
Priority Data:
61/590,215 24.01.2012 US
Title (EN) ALUMINUM COATED OR CERAMIC PARTS FOR SUBSTRATE DRIVE SYSTEM
(FR) PIÈCES GARNIES D'ALUMINIUM OU EN CÉRAMIQUE POUR SYSTÈME D'ENTRAÎNEMENT DE SUBSTRATS
Abstract: front page image
(EN)Embodiments of the present invention relate to apparatus and methods for cleaning substrate carriers and components in a processing chamber. A processing chamber according to the embodiment of the present invention includes components that are encapsulated, coated or made with materials compatible with cleaning plasma. A substrate carrier according to embodiments of the present invention may be formed by or coated with materials compatible with cleaning plasma. According to the embodiments of the present invention, plasma cleaning may be performed in a processing chamber having one or more substrate carriers without the presence of any substrates to clean the one or more substrate carriers and the chamber components.
(FR)Les modes de réalisation de l'invention concernent un appareil et des procédés de nettoyage de supports de substrats et de composants dans une chambre de traitement. Une chambre de traitement selon le mode de réalisation de l'invention inclut des composants dont la substance d'encapsulation, de garniture ou de fabrication est compatible avec le plasma de nettoyage. De tels supports de substrats selon les modes de réalisation de l'invention pourront être faits ou garnis de substances compatibles avec le plasma de nettoyage. Selon les modes de réalisation de l'invention, le nettoyage au plasma pourra être effectué dans une chambre de traitement comportant un ou plusieurs supports de substrats sans qu'il y ait présence de quelques substrats que ce soit pour nettoyer les supports de substrat considérés et les composants de la chambre.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)