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1. (WO2013111569) SUBSTRATE TREATMENT APPARATUS, LIQUID SUPPLY DEVICE USED THEREIN, AND SUBSTRATE TREATMENT METHOD

Pub. No.:    WO/2013/111569    International Application No.:    PCT/JP2013/000286
Publication Date: Fri Aug 02 01:59:59 CEST 2013 International Filing Date: Wed Jan 23 00:59:59 CET 2013
IPC: H01L 21/304
Applicants: DAINIPPON SCREEN MFG. CO., LTD.
大日本スクリーン製造株式会社
Inventors: TANAKA, Takayoshi
田中 孝佳
Title: SUBSTRATE TREATMENT APPARATUS, LIQUID SUPPLY DEVICE USED THEREIN, AND SUBSTRATE TREATMENT METHOD
Abstract:
This substrate treatment apparatus has a configuration in which a control unit (21) operates a transfer unit (9) to apply a treatment liquid to a substrate (W) from a cassette stage (3) in an application unit (15) and cause a contamination substance to adhere to the substrate (W) in a heat treatment unit (19). Since the treatment liquid containing the contamination substance is applied to the substrate (W) to cause the contamination substance to adhere thereto, the substrate (W) for evaluation, on which contamination in a wet process is reproduced, can be manufactured. Moreover, since the substrate (W) is subjected to heat treatment in the heat treatment unit (19) after the treatment liquid is applied thereto, the substrate (W) for evaluation, which has undergone baking treatment, can be manufactured.