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1. (WO2013110583) METHOD FOR DEEP MICRO-ETCHING
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2013/110583 International Application No.: PCT/EP2013/051094
Publication Date: 01.08.2013 International Filing Date: 22.01.2013
IPC:
C23F 4/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
F
NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACES; INHIBITING CORROSION OF METALLIC MATERIAL; INHIBITING INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25247
4
Processes for removing metallic material from surfaces, not provided for in group C23F1/ or C23F3/142
Applicants:
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) [FR/FR]; 3, rue Michel Ange F-75016 Paris, FR
Inventors:
DUSSART, Rémi; FR
LEFAUCHEUX, Philippe; FR
TILLOCHER, Thomas; FR
Agent:
REGIMBEAU; Espace Performance Bâtiment K F-35769 Saint Gregoire Cedex, FR
Priority Data:
125063123.01.2012FR
Title (EN) METHOD FOR DEEP MICRO-ETCHING
(FR) PROCEDE DE MICROGRAVURE PROFONDE
Abstract:
(EN) The invention relates to a method for the deep plasma micro-etching of a titanium object, according to which said titanium object is alternately etched using a first plasma consisting of at least one first chemical species, and then a second plasma consisting of at least one second chemical species, characterized in that said first chemical species is chlorine-based, while the second chemical species is fluorine-based.
(FR) L'invention se rapporte à un procédé de microgravure profonde par plasma d'un objet en titane, selon lequel on le grave alternativement à l'aide d'un premier plasma constitué d'au moins une première espèce chimique, puis d'un second plasma constitué d'au moins une seconde espèce chimique, caractérisé par le fait que ladite première espèce chimique est à base de chlore, tandis que la seconde est à base de fluor.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (EPO) (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)