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Machine translation
1. (WO2013059806) Novel Passivation Composition and Process
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/059806    International Application No.:    PCT/US2012/061355
Publication Date: 25.04.2013 International Filing Date: 22.10.2012
IPC:
H01L 21/31 (2006.01), H01L 21/469 (2006.01)
Applicants: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. [US/US]; 80 Circuit Drive North Kingstown, Rhode Island 02852 (US)
Inventors: KRUPA, Frank J.; (US).
WOJTCZAK, William A.; (US).
DU, Bing; (US).
TAKAHASHI, Tomonori; (US)
Agent: WEFERS, Marc M.; Fish & Richardson P.C. P.O. Box 1022 Minneapolis, Minnesota 55440-1022 (US)
Priority Data:
61/550,041 21.10.2011 US
Title (EN) Novel Passivation Composition and Process
(FR) NOUVELLE COMPOSITION DE PASSIVATION ET PROCEDES
Abstract: front page image
(EN)The present disclosure relates to semiconductor device manufacturing, and particularly to selective metal wet etching compositions and processes for selectively etching certain metals relative to adjacent structures and materials with those etching compositions. More particularly, the present disclosure relates to aqueous metal passivation and etching compositions, as well as to processes of using these compositions in the presence of nickel platinum silicides. This disclosure further relates to a passivation composition containing at least one sulfonic acid, at least one compound containing a nitrate or nitrosyl ion, and water, wherein the passivation composition is substantially free of a halide ion.
(FR)La présente invention concerne la fabrication d'un dispositif semi-conducteur, et en particulier des compositions sélectives pour gravure humide sur métal et les processus pour la gravure sélective de certains métaux par rapport aux structures et aux matériaux adjacents avec ces compositions de gravure. Plus particulièrement, la présente invention concerne la passivation aqueuse des métaux et les compositions de gravure, ainsi que des procédés d'utilisation de ces compositions en présence de siliciures de nickel-platine. Cette invention concerne en outre une composition de passivation contenant au moins un acide sulfonique, au moins un composé contenant un ion de nitrate ou de nitrosyle et de l'eau, dans laquelle la composition de passivation est sensiblement libre d'ion halogénure.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)