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1. (WO2013059686) FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/059686    International Application No.:    PCT/US2012/061150
Publication Date: 25.04.2013 International Filing Date: 19.10.2012
IPC:
C01G 49/00 (2006.01), C01B 33/107 (2006.01), B01J 19/24 (2006.01)
Applicants: REC SILICON INC [US/US]; 3322 Road N NE Moses Lake, WA 98837-8505 (US)
Inventors: JULSRUD, Stein; (US).
SJÅSTAD, Anja, Olafsen; (NO)
Agent: GARDNER, Gillian; Klarquist Sparkman, LLP One World Trade Center, Suite 1600 121 SW Salmon Street Portland, OR 97204 (US)
Priority Data:
61/549,701 20.10.2011 US
Title (EN) FOULING REDUCTION IN HYDROCHLOROSILANE PRODUCTION
(FR) RÉDUCTION DE L'ENCRASSEMENT DANS LA PRODUCTION D'HYDROCHLOROSILANE
Abstract: front page image
(EN)Embodiments of a method for reducing iron silicide and/or iron phosphide fouling and/or corrosion in a hydrochlorosilane production plant are disclosed. Sufficient trichlorosilane is included in a silicon tetrachloride process stream to minimize hydrogen chloride formation, thereby inhibiting iron (II) chloride formation and reducing iron silicide and/or iron phosphide fouling, superheater corrosion, or a combination thereof.
(FR)La présente invention concerne des modes de réalisation d'un procédé permettant de réduire l'encrassement au siliciure de fer et/ou phosphure de fer et/ou la corrosion dans une usine de production d'hydrochlorosilane. Une quantité suffisante de trichlorosilane est incluse dans un flux d'un procédé au tétrachlorure de silicium afin de réduire au minimum la formation de gaz chlorhydrique, ce qui inhibe la formation de chlorure de fer (II) et réduit l'encrassement au siliciure de fer et/ou phosphure de fer, la corrosion du surchauffeur, ou une combinaison associée.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)