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Machine translation
1. (WO2013059132) SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/059132    International Application No.:    PCT/US2012/060287
Publication Date: 25.04.2013 International Filing Date: 15.10.2012
IPC:
H05H 1/46 (2006.01), H01L 21/3065 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US) (For All Designated States Except US).
DORF, Leonid [RU/US]; (US) (US only).
RAUF, Shahid [US/US]; (US) (US only).
COLLINS, Kenneth S. [US/US]; (US) (US only).
MISRA, Nipun [IN/US]; (US) (US only).
CARDUCCI, James D. [US/US]; (US) (US only).
LERAY, Gary [FR/US]; (US) (US only).
RAMASWAMY, Kartik [US/US]; (US) (US only)
Inventors: DORF, Leonid; (US).
RAUF, Shahid; (US).
COLLINS, Kenneth S.; (US).
MISRA, Nipun; (US).
CARDUCCI, James D.; (US).
LERAY, Gary; (US).
RAMASWAMY, Kartik; (US)
Agent: PATTERSON, B. Todd; Law Office of Robert M. Wallace 2112 Eastman Avenue, Suite 102 Ventura, CA 93003 (US)
Priority Data:
61/549,336 20.10.2011 US
13/595,134 27.08.2012 US
Title (EN) SWITCHED ELECTRON BEAM PLASMA SOURCE ARRAY FOR UNIFORM PLASMA PRODUCTION
(FR) RÉSEAU DE SOURCES PLASMA DE FAISCEAU D'ÉLECTRONS COMMUTÉ POUR PRODUCTION DE PLASMA UNIFORME
Abstract: front page image
(EN)An array of electron beam sources surrounding a processing region of a plasma reactor is periodically switched to change electron beam propagation direction and remove or reduce non-uniformities.
(FR)La présente invention porte sur un réseau de sources de faisceau d'électrons entourant une région de traitement d'un réacteur plasma qui est périodiquement commuté pour changer une direction de propagation de faisceau d'électrons et retirer ou réduire des non-uniformités.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)