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1. (WO2013059101) ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM PLASMA GENERATION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/059101    International Application No.:    PCT/US2012/060088
Publication Date: 25.04.2013 International Filing Date: 12.10.2012
IPC:
H05H 1/24 (2006.01), H05H 1/34 (2006.01), H01L 21/205 (2006.01)
Applicants: APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Avenue Santa Clara, CA 95054 (US) (For All Designated States Except US).
BERA, Kallol [US/US]; (US) (US only).
COLLINS, Kenneth S. [US/US]; (US) (US only).
RAUF, Shahid [US/US]; (US) (US only).
DORF, Leonid [RU/US]; (US) (US only)
Inventors: BERA, Kallol; (US).
COLLINS, Kenneth S.; (US).
RAUF, Shahid; (US).
DORF, Leonid; (US)
Agent: WALLACE, Robert M.; Law Office of Robert M. Wallace 2112 Eastman Avenue, Suite 102 Ventura, CA 93003 (US)
Priority Data:
61/549,355 20.10.2011 US
13/595,351 27.08.2012 US
Title (EN) ELECTRON BEAM PLASMA SOURCE WITH PROFILED CHAMBER WALL FOR UNIFORM PLASMA GENERATION
(FR) SOURCE PLASMA DE FAISCEAU D'ÉLECTRONS À PAROI DE CHAMBRE PROFILÉE POUR GÉNÉRATION DE PLASMA UNIFORME
Abstract: front page image
(EN)A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source chamber with a wall opposite to the electron beam propagation direction, the wall being profiled to compensate for a non-uniformity in electron beam density distribution.
(FR)Selon la présente invention, un réacteur plasma qui génère un plasma dans une chambre de traitement de pièce de travail par un faisceau d'électrons, a une chambre de source de faisceau d'électrons ayant une paroi opposée à la direction de propagation de faisceau d'électrons, la paroi étant profilée pour compenser une non-uniformité dans la distribution de densité du faisceau d'électrons.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)