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Machine translation
1. (WO2013058458) METHOD AND APPARATUS FOR MANUFACTURING A LOW MELTING POINT NANO GLASS POWDER
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/058458    International Application No.:    PCT/KR2012/004547
Publication Date: 25.04.2013 International Filing Date: 08.06.2012
IPC:
C03B 19/10 (2006.01), C03B 19/14 (2006.01), C03B 20/00 (2006.01), C03C 12/00 (2006.01)
Applicants: INHA-INDUSTRY PARTNERSHIP INSTITUTE [KR/KR]; (Yonghyeon-dong) Inha Univ 100, Inha-ro, Nam-gu Incheon 402-752 (KR) (For All Designated States Except US).
KIM, Hyung Sun [KR/KR]; (KR) (For US Only).
PARK, Dong Wha [KR/KR]; (KR) (For US Only).
CHO, Sung Hwan [KR/KR]; (KR) (For US Only).
KIM, Sun Il [KR/KR]; (KR) (For US Only).
LEE, Won Kyung [KR/KR]; (KR) (For US Only).
SHIM, Hyun Jin [KR/KR]; (KR) (For US Only)
Inventors: KIM, Hyung Sun; (KR).
PARK, Dong Wha; (KR).
CHO, Sung Hwan; (KR).
KIM, Sun Il; (KR).
LEE, Won Kyung; (KR).
SHIM, Hyun Jin; (KR)
Agent: OH, Wi-Hwan; 5th Fl., Eunseong Bldg. 601-18 Yeoksam-dong, Kangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2011-0107326 20.10.2011 KR
Title (EN) METHOD AND APPARATUS FOR MANUFACTURING A LOW MELTING POINT NANO GLASS POWDER
(FR) PROCÉDÉ ET APPAREIL POUR FABRIQUER UNE NANOPOUDRE DE VERRE À POINT DE FUSION BAS
(KO) 저융점 나노 유리 분말의 제조방법 및 제조장치
Abstract: front page image
(EN)The present invention relates to a method and apparatus for manufacturing a low melting point nano glass powder, which use thermal plasma generated by a direct current power source and are capable of manufacturing a bismuth-based nano glass powder, that uses bismuth (Bi) instead of the traditional lead (Pb) as the main ingredient, at a low sintering temperature, quickly at a low cost, and without fear of polluting the environment. The method of the present invention comprises the steps of: preparing a bismuth-based low melting point glass powder precursor of a micro size, having bismuth (Bi) as the main ingredient; injecting the glass powder precursor into a reaction chamber of a plasma treatment device; applying thermal plasma via a direct current power source to the glass powder precursor injected into the reaction chamber, to vaporize the glass powder precursor; and generating nano glass powder having a nano size by quenching the gas generated by vaporizing the glass powder precursor.
(FR)La présente invention concerne un procédé et un appareil pour fabriquer une nanopoudre de verre à point de fusion bas, faisant appel à un plasma thermique généré par une source d'alimentation en courant continu et permettant de fabriquer une nanopoudre de verre à base de bismuth, en utilisant du bismuth (Bi) comme ingrédient principal à la place du plomb (Pb) traditionnellement utilisé. La fabrication s'effectue à une température de frittage basse, rapidement, à faible coût et sans danger pour l'environnement. Le procédé selon la présente invention comprend les étapes suivantes : la préparation d'un précurseur de poudre de verre à point de fusion bas à base de bismuth de taille micrométrique, contenant principalement du bismuth (Bi) ; l'injection du précurseur de poudre de verre dans une chambre réactionnelle d'un dispositif de traitement par plasma ; l'application d'un plasma thermique par l'intermédiaire d'une source d'alimentation en courant continu au précurseur de poudre de verre injecté dans la chambre réactionnelle, afin de vaporiser ledit précurseur de poudre de verre ; et la génération d'une nanopoudre de verre de taille nanométrique par le refroidissement rapide du gaz généré par la vaporisation du précurseur de poudre de verre.
(KO)본 발명은 나노 유리 분말의 제조방법 및 제조방법에 관한 것으로, 직류전원에 의한 열플라즈마를 이용함으로써 기존의 납(Pb) 대신 비스무스(Bi)를 주성분으로 하는 비스무스계 나노 유리 분말을 낮은 소성 온도에서는 물론, 저렴한 비용으로 신속하면서도 환경오염의 염려 없이 제조할 수 있도록 한 것이다. 이러한 본 발명은, 비스무스(Bi)를 주성분으로 하는 마이크로 크기의 비스무스계 저융점 유리 분말 전구체를 마련하는 단계와, 유리 분말 전구체를 플라즈마 처리 장치의 반응관 내부로 주입하는 단계와, 반응관 내부로 주입되는 유리 분말 전구체에 직류전원에 의한 열플라즈마를 가하여 유리 분말 전구체를 기화시키는 단계와, 유리 분말 전구체가 기화되어 생성된 기체를 급랭시켜 나노 크기를 갖는 나노 유리 분말을 생성하는 단계를 포함하여 이루어진다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)