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Machine translation
1. (WO2013058319) FILM FORMATION DEVICE AND FILM FORMATION METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/058319    International Application No.:    PCT/JP2012/076955
Publication Date: 25.04.2013 International Filing Date: 18.10.2012
IPC:
C23C 14/24 (2006.01), H01L 51/50 (2006.01), H05B 33/10 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-1 Akasaka 5-chome, Minato-ku, Tokyo 1076325 (JP).
KYUSHU UNIVERSITY, NATIONAL UNIVERSITY CORPORATION [JP/JP]; 6-10-1, Hakozaki, Higashi-ku, Fukuoka-shi, Fukuoka 8128581 (JP)
Inventors: EDURA Tomohiko; (JP).
ADACHI Chihaya; (JP)
Agent: HASEGAWA Yoshiki; SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA (Meiji Yasuda Life Bldg.) 9th fl., 1-1, Marunouchi 2-chome, Chiyoda-ku, Tokyo 1000005 (JP)
Priority Data:
2011-229091 18.10.2011 JP
Title (EN) FILM FORMATION DEVICE AND FILM FORMATION METHOD
(FR) DISPOSITIF DE FORMATION DE MEMBRANE ET PROCÉDÉ DE FORMATION DE MEMBRANE
(JA) 成膜装置及び成膜方法
Abstract: front page image
(EN) This film formation device is provided with: a processing chamber that accommodates an object to be processed; a first nozzle that sprays the object to be processed with a gas including a carrier gas and a vapor deposition material for depositing a film on the object to be processed; a second nozzle that sprays a first inert gas on the film; and a temperature adjuster that adjusts the temperature of the first inert gas.
(FR)L'invention concerne un dispositif de formation de membrane comprenant: une chambre de traitement dans laquelle est logé un corps à traiter; une première buse destinée à projeter sur le corps à traiter un gaz contenant un gaz vecteur et une matière destinée au dépôt en phase vapeur d'une membrane sur le corps à traiter; une deuxième buse destinée à projeter sur la membrane un premier gaz inerte; un appareil régulateur de température destiné à réguler la température du premier gaz inerte.
(JA) 成膜装置は、被処理体を収容する処理チャンバと、被処理体上に膜を蒸着するための蒸着材料及びキャリアガスを含むガスを被処理体に噴き付ける第1のノズルと、第1の不活性ガスを膜に噴き付ける第2のノズルと、第1の不活性ガスの温度を調節する温度調節器とを備える。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)