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Pub. No.:    WO/2013/055056    International Application No.:    PCT/KR2012/007977
Publication Date: 18.04.2013 International Filing Date: 02.10.2012
H05H 1/36 (2006.01)
Applicants: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY [KR/KR]; 373-1, Guseong-dong Yuseong-gu Daejeon 305-701 (KR) (For All Designated States Except US).
WINTEL CO., LTD [KR/KR]; 511-56, Yeongcheon-ri, Dongtan-myeon Hwaseong-si Gyeonggi-do 445-813 (KR) (For All Designated States Except US).
CHANG, Hong-Young [KR/KR]; (KR) (US only).
LEE, Jin-Won [KR/KR]; (KR) (US only)
Inventors: CHANG, Hong-Young; (KR).
LEE, Jin-Won; (KR)
Agent: LEE, Pyung-Woo; 1613, Union Center B/D, 837-11, Yeoksam-dong Gangnam-gu Seoul 135-080 (KR)
Priority Data:
10-2011-0104792 13.10.2011 KR
(KO) 플라즈마 장치 및 기판 처리 장치
Abstract: front page image
(EN)The present invention provides a plasma-generating apparatus and a substrate-processing apparatus. The plasma-generating apparatus comprises: a plurality of dielectric tubes installed respectively in a plurality of through-holes formed in a vacuum chamber; antennas, which are divided into a first group and a second group based on the symmetrical disposition thereof in the vacuum chamber, and which are mounted on the outsides of the dielectric tubes, respectively; a first RF power source for supplying power to the first group of antennas; a second RF power source for supplying power to the second group of antennas; and a first power distribution unit, disposed between the first group of antennas and the first RF power source, for distributing power from the first RF power source to the first group of antennas.
(FR)La présente invention concerne un appareil de génération de plasma et un appareil de traitement de substrat. L'appareil de génération de plasma comprend : une pluralité de tubes diélectriques installés dans une pluralité de trous traversants formés dans une chambre à vide, respectivement ; des antennes, qui sont divisées en un premier groupe et en un second groupe sur la base de la disposition symétrique de celles-ci dans la chambre à vide, et qui sont montés sur les extérieurs des tubes diélectriques, respectivement ; une première source d'énergie RF distribuant une énergie au premier groupe d'antennes ; une seconde source d'énergie RF distribuant une énergie au second groupe d'antennes ; et une première unité de distribution d'énergie disposée entre le premier groupe d'antennes et la première source d'énergie RF et distribuant une énergie de la première source d'énergie RF au premier groupe d'antennes.
(KO)본 발명의 플라즈마 발생 장치 및 기판 처리 장치를 제공한다. 이 플라즈마 발생 장치는 진공 용기에 형성된 복수의 관통홀들에 각각 장착되는 복수의 유전체 튜브들, 진공 용기에 배치되는 대칭성에 따라 제1 그룹 및 제2 그룹으로 분류되고 유전체 튜브들의 외측에 각각 장착되는 안테나들, 제1 그룹의 안테나에 전력을 공급하는 제1 RF 전원, 제2 그룹의 안테나에 전력을 공급하는 제2 RF 전원, 및 제1 그룹의 안테나와 제1 RF 전원 사이에 배치되어 제1 RF 전원의 전력을 제1 그룹의 안테나에 전력을 분배하는 제1 전력 분배부를 포함한다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)