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Machine translation
1. (WO2013055023) SYSTEMS AND METHODS FOR PROCESSING SUBSTRATES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/055023    International Application No.:    PCT/KR2012/006240
Publication Date: 18.04.2013 International Filing Date: 06.08.2012
IPC:
H01L 21/3065 (2006.01)
Applicants: TES CO., LTD [KR/KR]; 640-1bunji Jeil-ri, Yangji-myeon, Cheoin-gu, Yongin Si Gyeonggi-Do 449-825 (KR) (For All Designated States Except US).
LEE, Dong-Duk [KR/KR]; (KR) (For US Only).
LEE, U-Young [KR/KR]; (KR) (For US Only).
LEE, Sang-Sun [KR/KR]; (KR) (For US Only)
Inventors: LEE, Dong-Duk; (KR).
LEE, U-Young; (KR).
LEE, Sang-Sun; (KR)
Agent: SONG, Kyeong-Keun; 7F., Blue Tower 56, Seocho-Jungangro, Seocho-gu Seoul 137-878 (KR)
Priority Data:
10-2011-0104667 13.10.2011 KR
Title (EN) SYSTEMS AND METHODS FOR PROCESSING SUBSTRATES
(FR) SYSTÈMES ET PROCÉDÉS DE TRAITEMENT DE SUBSTRATS
Abstract: front page image
(EN)A substrate processing system comprises a first processing module in which a process gas is supplied to a substrate to etch a silicon oxide layer formed on the substrate and a second processing module in which an activated oxygen gas is supplied to the substrate. With the system and a method using the same, the silicon oxide layer can be etched and a condensation layer and/or fumes and/or photoresist residues can be removed in a cost-effective way.
(FR)La présente invention concerne un système de traitement de substrats, comprenant un premier module de traitement dans lequel un gaz de procédé est fourni au substrat pour graver une couche d'oxyde de silicium formée sur le substrat, et un second module de traitement dans lequel de l'oxygène actif gazeux est fourni au substrat. Grâce au système et au procédé de l'invention, une couche d'oxyde de silicium peut être gravée et une couche de condensation et/ou des fumées et/ou des résidus de résine photosensible peuvent être éliminés de manière économique.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)