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Machine translation
1. (WO2013049207) POST-CMP CLEANING APPARATUS AND METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/049207    International Application No.:    PCT/US2012/057337
Publication Date: 04.04.2013 International Filing Date: 26.09.2012
IPC:
H01L 21/304 (2006.01), H01L 21/302 (2006.01)
Applicants: ENTEGRIS, INC. [US/US]; 129 Concord Road Billerica, MA 01821 (US).
PATEL, Chintan [US/US]; (US)
Inventors: PATEL, Chintan; (US)
Agent: CHRISTENSEN, Douglas, J.; Patterson Thuente Christensen Pedersen, P.A. 4800 Ids Center 80 South Eighth Street Minneapolis, MN 55402-2100 (US)
Priority Data:
61/539,342 26.09.2011 US
Title (EN) POST-CMP CLEANING APPARATUS AND METHOD
(FR) APPAREIL ET PROCÉDÉ DE NETTOYAGE POST-CMP
Abstract: front page image
(EN)A brush for cleaning of substrates such as for post chemical mechanical polishing (post-CMP) of the substrates, utilizes asymmetrical nodules or nodules with varying spacing, size, features, densities to provide an improved cleaning of substrates.
(FR)Une brosse destinée au nettoyage de substrats, tel que le post-polissage chimico-mécanique (post-CMP) des substrats, utilise des nodules asymétriques ou des nodules ayant un espacement, une taille, des caractéristiques, des densités variables pour permettre un nettoyage amélioré de substrats.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)