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Machine translation
1. (WO2013048069) POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND INSULATING FILM AND OLED FORMED USING THE SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/048069    International Application No.:    PCT/KR2012/007643
Publication Date: 04.04.2013 International Filing Date: 24.09.2012
IPC:
G03F 7/039 (2006.01), G03F 7/004 (2006.01), H01L 51/50 (2006.01)
Applicants: KOLON INDUSTRIES, INC. [KR/KR]; 1-23 Byeoryang-dong, Gwacheon-si Gyeongg-do 427-709 (KR) (For All Designated States Except US).
PARK, Se Hyung [KR/KR]; (KR) (US only).
KIM, Byoung Kee [KR/KR]; (KR) (US only)
Inventors: PARK, Se Hyung; (KR).
KIM, Byoung Kee; (KR)
Agent: KONG, Min Ho; 10th floor, BYC Building 648-1, Yeoksam-dong Gangnam-gu, Seoul 135-080 (KR)
Priority Data:
10-2011-0100307 30.09.2011 KR
Title (EN) POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, AND INSULATING FILM AND OLED FORMED USING THE SAME
(FR) COMPOSITION DE RÉSINE PHOTOSENSIBLE DE TYPE POSITIF, FILM ISOLANT ET OLED FORMÉS À L'AIDE DE CELLE-CI
Abstract: front page image
(EN)This invention relates to a positive-type photosensitive resin composition which includes an alkali soluble polyimide resin, a diazide-based photosensitive compound and a sensitivity enhancer, and in which the use of a polyimide resin wherein the degree of imidization of imidized polyimide resin is 50 ~ 75% exhibits a light transmittance of 95% or more in the visible light wavelength range (400 ~ 650 nm) as well as high developability in a patterning process, and to an insulating film and an OLED formed using the same.
(FR)Cette invention concerne une composition de résine photosensible de type positif qui contient une résine polyimide soluble dans un alcali, un composé photosensible à base de diazoture et un activateur de sensibilité. La résine polyimide utilisée qui a un degré d'imidation de résine polyimide imidisée de 50 ~ 75 % fait preuve d'une transmission de la lumière de 95 % ou plus dans la plage des longueurs d'ondes de la lumière visible (400 ~ 650 nm) et d'une aptitude à la révélation élevée dans un procédé de formation de motifs. Un film isolant et une OLED formés à l'aide de ladite composition sont également décrits.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)