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Machine translation
1. (WO2013047916) CAMERA
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/047916    International Application No.:    PCT/KR2011/007065
Publication Date: 04.04.2013 International Filing Date: 26.09.2011
IPC:
H01L 21/027 (2006.01), G03F 7/20 (2006.01)
Applicants: SEONG, Nak Hoon [KR/KR]; (KR).
KIM, Jung Sik [KR/KR]; (KR).
NNP CO., LTD. [KR/KR]; RIT-607 Gyeonggi Technopark, 1271-11 Sa-dong, Sangnok-gu, Ansan-si, Gyeonggi-do 426-170 (KR) (For All Designated States Except US)
Inventors: SEONG, Nak Hoon; (KR).
KIM, Jung Sik; (KR)
Agent: SEONG, Nak Hoon; Songchon B/D 16th Floor 642-9 Yeoksam 1(il)-dong, Gangnam-gu Seoul 135-910 (KR)
Priority Data:
Title (EN) CAMERA
(FR) CAMÉRA
(KO) 촬영기
Abstract: front page image
(EN)The present invention relates to lenticular lithography equipment which comprises: a light source; a film irradiated with light emitted from the light source; a plate which receives the irradiated light through the film and on which a photoresist is applied; and a lenticular lens closely adhered to the film. Accordingly, by using a light-collecting function of the lenticular lens in the lithography equipment, clear exposure is possible even though the thickness of the photoresist is tens of microns to hundreds of microns. In addition, a clear and distinct configuration of a circuit is possible without any defects, even though the pitch of the circuit is 10 microns to 20 microns.
(FR)La présente invention concerne un équipement de lithographie lenticulaire qui comprend : une source lumineuse ; un film irradié par la lumière émise par la source lumineuse ; une plaque qui reçoit la lumière irradiée à travers le film et sur laquelle une résine photosensible est appliquée ; et une lentille lenticulaire fermement collée au film. Par conséquent, à l'aide d'une fonction de collecte de lumière de la lentille lenticulaire dans l'équipement de lithographie, une exposition claire est possible même si l'épaisseur de la résine photosensible est de l'ordre de dizaines de microns à des centaines de micromètres. De plus, une configuration claire et distincte d'un circuit est possible sans aucun défaut, même si le pas du circuit est de 10 micromètres à 20 micromètres.
(KO)본 발명은 렌티큘라 노광기에 관한 것으로서, 광원과; 상기 광원의 빛이 조사되어지는 필름과; 상기 필름을 통하여 조사되어진 빛을 받는 감광제가 도포된 평판과, 상기 필름에 밀착되는 렌티큘라를 포함하는 것을 특징으로 한다. 이에 의해, 렌티큘라의 집광기능을 노광기에 사용함으로써 감광제의 두께가 수십마이크론에서 수백마이크론이 되더라도 깨끗한 노광이 가능하며, 회로의 피치가 10~20 마이크론 일지라도 깨끗한 노광으로 불량이 없고 선명하여 깨끗한 회로의 구성이 가능하다.
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Korean (KO)
Filing Language: Korean (KO)