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Pub. No.:    WO/2013/047733    International Application No.:    PCT/JP2012/075051
Publication Date: 04.04.2013 International Filing Date: 28.09.2012
H01L 21/304 (2006.01), B24B 37/00 (2012.01), C09K 3/14 (2006.01), H01L 27/105 (2006.01), H01L 45/00 (2006.01)
Applicants: FUJIMI INCORPORATED [JP/JP]; 1-1, Chiryo 2-chome, Nishibiwajima-cho, Kiyosu-shi, Aichi 4528502 (JP) (For All Designated States Except US).
IZAWA, Yoshihiro [JP/JP]; (JP) (US only).
YOSHIZAKI, Yukinobu [JP/JP]; (JP) (US only)
Inventors: IZAWA, Yoshihiro; (JP).
YOSHIZAKI, Yukinobu; (JP)
Agent: ONDA, Hironori; 12-1, Ohmiya-cho 2-chome, Gifu-shi, Gifu 5008731 (JP)
Priority Data:
2011-218721 30.09.2011 JP
(JA) 研磨用組成物
Abstract: front page image
(EN)This polishing composition is used for the purpose of polishing an object of polishing that has a phase change alloy. This polishing composition is characterized by containing an ionic additive. Examples of the ionic additive include a cationic surfactant, an anionic surfactant, an amphoteric surfactant and a cationic water-soluble polymer.
(FR)La présente invention concerne une composition de polissage qui est utilisée pour polir un objet possédant un alliage à changement de phase. Cette composition de polissage est caractérisée en ce qu'elle contient un additif ionique. Des exemples de l'additif ionique comprennent un agent tensioactif cationique, un agent tensioactif anionique, un agent tensioactif amphotère et un polymère cationique hydrosoluble.
(JA) 本発明の研磨用組成物は、相変化合金を有する研磨対象物を研磨する用途で使用される研磨用組成物であって、イオン性添加剤を含有することを特徴とする。イオン性添加剤の例としては、カチオン性界面活性剤、アニオン性界面活性剤、両性界面活性剤、及びカチオン性水溶性高分子が挙げられる。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)