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1. WO2013047312 - RESIN COMPOSITION FOR PATTERN FORMATION, AND RESIN MOLDED ARTICLE HAVING PATTERN AND METHOD FOR PRODUCING SAME

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Publication Number WO/2013/047312
Publication Date 04.04.2013
International Application No. PCT/JP2012/074027
International Filing Date 20.09.2012
IPC
C08L 51/04 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
51Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
04grafted on to rubbers
C08L 25/06 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
25Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
02Homopolymers or copolymers of hydrocarbons
04Homopolymers or copolymers of styrene
06Polystyrene
C08L 71/12 2006.1
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
71Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
08Polyethers derived from hydroxy compounds or from their metallic derivatives
10from phenols
12Polyphenylene oxides
CPC
C08L 25/06
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
25Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
02Homopolymers or copolymers of hydrocarbons
04Homopolymers or copolymers of styrene
06Polystyrene
C08L 55/02
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
55Compositions of homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups C08L23/00 - C08L53/00
02ABS [Acrylonitrile-Butadiene-Styrene] polymers
Applicants
  • 長瀬産業株式会社 NAGASE & CO., LTD. [JP]/[JP]
Inventors
  • 濱平　英三 HAMAHIRA Eizo
  • 堀川　厳 HORIKAWA Gen
  • 木村　雅哉 KIMURA Masaya
Agents
  • 長谷川　芳樹 HASEGAWA Yoshiki
Priority Data
2011-21777130.09.2011JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) RESIN COMPOSITION FOR PATTERN FORMATION, AND RESIN MOLDED ARTICLE HAVING PATTERN AND METHOD FOR PRODUCING SAME
(FR) COMPOSITION DE RÉSINE POUR LA FORMATION D'UN MOTIF ET ARTICLE MOULÉ DE RÉSINE AYANT UN MOTIF ET SON PROCÉDÉ DE FABRICATION
(JA) 模様形成用樹脂組成物、並びに、模様を有する樹脂成形品及びその製造方法
front page image
Abstract
(EN) Provided is a resin composition for pattern formation, which comprises a polyphenylene ether resin and a polystyrene resin, and which can be used for producing a resin molded article having a pattern by molding the resin composition together with a thermoplastic resin having a molding processing temperature of 170-250˚C.
(FR) L'invention concerne sur une composition de résine pour la formation d'un motif, qui comprend une résine de polyphénylène éther et une résine de polystyrène et qui peut être utilisée pour produire un article moulé de résine ayant un motif par moulage de la composition de résine conjointement avec une résine thermoplastique ayant une température de traitement de moulage de 170-250˚C.
(JA) ポリフェニレンエーテル樹脂と、ポリスチレン樹脂と、を含む樹脂組成物であって、成形加工温度が１７０～２５０℃である熱可塑性樹脂を当該樹脂組成物とともに成形して模様を有する樹脂成形品を製造するために用いられる、模様形成用樹脂組成物を提供する。
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