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Machine translation
1. (WO2013047259) NANOIMPRINTING APPARATUS, NANOIMPRINTING METHOD, DISTORTION IMPARTING DEVICE AND DISTORTION IMPARTING METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/047259    International Application No.:    PCT/JP2012/073767
Publication Date: 04.04.2013 International Filing Date: 11.09.2012
IPC:
H01L 21/027 (2006.01), B29C 59/02 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1068620 (JP) (For All Designated States Except US).
WAKAMATSU, Satoshi [JP/JP]; (JP) (For US Only).
HATTORI, Akiko [JP/JP]; (JP) (For US Only)
Inventors: WAKAMATSU, Satoshi; (JP).
HATTORI, Akiko; (JP)
Agent: YANAGIDA, Masashi; YANAGIDA & Associates, 7F, Shin-Yokohama KS Bldg., 3-18-3, Shin-Yokohama, Kohoku-ku, Yokohama-shi, Kanagawa 2220033 (JP)
Priority Data:
2011-212135 28.09.2011 JP
Title (EN) NANOIMPRINTING APPARATUS, NANOIMPRINTING METHOD, DISTORTION IMPARTING DEVICE AND DISTORTION IMPARTING METHOD
(FR) APPAREIL DE NANOIMPRESSION, PROCÉDÉ DE NANOIMPRESSION, DISPOSITIF D'APPLICATION DE DISTORSION ET PROCÉDÉ D'APPLICATION DE DISTORSION
Abstract: front page image
(EN)In nanoimprinting, contact between a pattern of protrusions and recesses of a mold and resist being initiated at the center thereof is enabled utilizing any imprinting member regardless of the rigidity of the imprinting member. A nanoimprinting apparatus (10) is equipped with: a distortion imparting device (20) that applies external force onto an imprinting member (1) to maintain the imprinting member (1) in a predetermined flexed state, thereby imparting permanent distortion to the imprinting member (1); and an imprinting unit (40) that utilizes the imprinting member (1) having the permanent distortion imparted thereto and presses a pattern (2) of protrusions and recesses of a mold (1) onto resist (7) provided on a substrate (6), to transfer the pattern (2) of protrusions and recesses to the resist (7).
(FR)Dans la nanoimpression, le contact entre un motif de saillies et de renfoncements d'un moule et une résine, qui débute au centre de celui-ci, permet d'utiliser un élément d'impression quelconque, quelle que soit la rigidité de l'élément d'impression. Un appareil de nanoimpression (10) comprend : un dispositif d'application de distorsion (20) qui applique une force extérieure à un élément d'impression, afin de maintenir l'élément d'impression (1) dans un état fléchi prédéterminé, ce qui applique une distorsion permanente à l'élément d'impression (1); et une unité d'impression (40) qui utilise l'élément d'impression (1) auquel a été appliquée une distorsion permanente et applique un motif (2) de saillies et de renfoncements d'un moule (1) sur de la résine (7) placée sur un substrat (6), afin de transférer le motif (2) de saillies et de renfoncements à la résine (7).
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)