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1. (WO2013047136) CURABLE COMPOSITION FOR IMPRINT, PATTERN FORMING METHOD, AND PATTERN
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2013/047136    International Application No.:    PCT/JP2012/072686
Publication Date: 04.04.2013 International Filing Date: 06.09.2012
IPC:
H01L 21/027 (2006.01), B29C 59/02 (2006.01), C08F 2/44 (2006.01)
Applicants: FUJIFILM CORPORATION [JP/JP]; 26-30, Nishiazabu 2-chome, Minato-ku, Tokyo 1060031 (JP) (For All Designated States Except US).
ENOMOTO Yuichiro [JP/JP]; (JP) (For US Only).
KODAMA Kunihiko [JP/JP]; (JP) (For US Only).
TARUTANI Shinji [JP/JP]; (JP) (For US Only)
Inventors: ENOMOTO Yuichiro; (JP).
KODAMA Kunihiko; (JP).
TARUTANI Shinji; (JP)
Agent: SIKs & Co.; 8th Floor, Kyobashi-Nisshoku Bldg., 8-7, Kyobashi 1-chome, Chuo-ku, Tokyo 1040031 (JP)
Priority Data:
2011-210530 27.09.2011 JP
Title (EN) CURABLE COMPOSITION FOR IMPRINT, PATTERN FORMING METHOD, AND PATTERN
(FR) COMPOSITION DURCISSABLE POUR EMPREINTE, PROCÉDÉ DE FORMATION D'UN MOTIF ET MOTIF
(JA) インプリント用硬化性組成物、パターン形成方法およびパターン
Abstract: front page image
(EN)Provided is a curable composition for imprint, a cured film of which has improved surface roughness. A curable composition for imprint, which contains (A) a polymerizable compound, (B) a polymerization initiator and (C) a non-polymerizable compound. The curable composition for imprint contains, as the non-polymerizable compound (C): (C1) at least one kind of surfactant that contains 20% by mass of more of fluorine atoms; and (C2) at least one kind of polymer that contains 3% by mass or more but less than 20% by mass of fluorine atoms and/or 5% by mass or more but less than 40% by mass of silicon atoms and that has a weight average molecular weight (Mw) of 1,000-100,000.
(FR)L'invention concerne une composition durcissable pour empreinte, dont un film durci a une rugosité de surface améliorée. Une composition durcissable pour empreinte, qui contient (A) un composé polymérisable, (B) un initiateur de polymérisation et (C) un composé non polymérisable. La composition durcissable pour empreinte contient, comme composé non polymérisable (C) : (C1) au moins une sorte d'agent tensio-actif qui contient 20 % en masse ou plus d'atomes de fluor ; et (C2) au moins une sorte de polymère qui contient 3 % en masse ou plus mais moins de 20 % en masse d'atomes de fluor et/ou 5 % en masse ou plus mais moins de 40 % en masse d'atomes de silicium et qui a une masse moléculaire moyenne en poids (Mw) de 1 000-100 000.
(JA) 硬化膜の表面ラフネスが改善されたインプリント用硬化性組成物の提供。 (A)重合性化合物、(B)重合開始剤および(C)非重合性化合物を含有するインプリント用硬化性組成物であって、前記非重合性化合物(C)として、(C1)フッ素原子を20質量%以上含有する少なくとも1種の界面活性剤、および(C2)フッ素原子を3質量%以上20質量%未満および/またはケイ素原子を5質量%以上40質量%未満含有し、かつ重量平均分子量(Mw)が1000~100000である少なくとも1種の重合体を含有するインプリント用硬化性組成物。
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)