Processing

Please wait...

Settings

Settings

Goto Application

1. WO2013045168 - MICROMECHANICAL SENSOR APPARATUS HAVING A MOVABLE GATE AND CORRESPONDING PRODUCTION METHOD

Publication Number WO/2013/045168
Publication Date 04.04.2013
International Application No. PCT/EP2012/065942
International Filing Date 15.08.2012
IPC
G01P 15/08 2006.1
GPHYSICS
01MEASURING; TESTING
PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION OR SHOCK; INDICATING PRESENCE OR ABSENCE OF MOVEMENT;  INDICATING DIRECTION OF MOVEMENT 
15Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
02by making use of inertia forces
08with conversion into electric or magnetic values
G01P 15/12 2006.1
GPHYSICS
01MEASURING; TESTING
PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION OR SHOCK; INDICATING PRESENCE OR ABSENCE OF MOVEMENT;  INDICATING DIRECTION OF MOVEMENT 
15Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
02by making use of inertia forces
08with conversion into electric or magnetic values
12by alteration of electrical resistance
G01L 9/00 2006.1
GPHYSICS
01MEASURING; TESTING
LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
9Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
CPC
B81B 2201/025
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
2201Specific applications of microelectromechanical systems
02Sensors
0228Inertial sensors
025Inertial sensors not provided for in B81B2201/0235 - B81B2201/0242
B81B 2201/0264
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
2201Specific applications of microelectromechanical systems
02Sensors
0264Pressure sensors
B81B 3/0021
BPERFORMING OPERATIONS; TRANSPORTING
81MICROSTRUCTURAL TECHNOLOGY
BMICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
3Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
0018Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
0021Transducers for transforming electrical into mechanical energy or vice versa
G01L 9/0098
GPHYSICS
01MEASURING; TESTING
LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
9Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements
0098using semiconductor body comprising at least one PN junction as detecting element
G01P 15/0802
GPHYSICS
01MEASURING; TESTING
PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
15Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
02by making use of inertia forces ; using solid seismic masses
08with conversion into electric or magnetic values
0802Details
G01P 15/124
GPHYSICS
01MEASURING; TESTING
PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
15Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
02by making use of inertia forces ; using solid seismic masses
08with conversion into electric or magnetic values
12by alteration of electrical resistance
124by semiconductor devices comprising at least one PN junction, e.g. transistors
Applicants
  • ROBERT BOSCH GMBH [DE]/[DE] (AllExceptUS)
  • FEYH, Ando [US]/[US] (UsOnly)
Inventors
  • FEYH, Ando
Common Representative
  • ROBERT BOSCH GMBH
Priority Data
102011083644.628.09.2011DE
Publication Language German (de)
Filing Language German (DE)
Designated States
Title
(DE) MIKROMECHANISCHE SENSORVORRICHTUNG MIT BEWEGLICHEM GATE UND ENTSPRECHENDES HERSTELLUNGSVERFAHREN
(EN) MICROMECHANICAL SENSOR APPARATUS HAVING A MOVABLE GATE AND CORRESPONDING PRODUCTION METHOD
(FR) DISPOSITIF CAPTEUR MICROMÉCANIQUE À GRILLE MOBILE ET PROCÉDÉ DE FABRICATION CORRESPONDANT
Abstract
(DE) Die Erfindung schafft eine eine mikromechanische Sensorvorrichtung mit beweglichem Gate und ein entsprechendes Herstellungsverfahren. Die Sensorvorrichtung mit beweglichem Gate umfasst einen Feldeffekt-Transistor (2) mit einem beweglichen Gate (7), welches durch einen Hohlraum (11) von einem Kanalbereich (K) getrennt ist, wobei der Kanalbereich (K) von einer Gateisolationsschicht (3) bedeckt ist.
(EN) The invention provides a micromechanical sensor apparatus having a movable gate and a corresponding production method. The sensor apparatus having a movable gate comprises a field effect transistor (2) having a movable gate (7) which is separated from a channel region (K) by a cavity (11), wherein the channel region (K) is covered by a gate insulation layer (3).
(FR) L'invention concerne un dispositif capteur micromécanique à grille mobile et un procédé de fabrication correspondant. Le dispositif capteur à grille mobile comporte un transistor à effet de champ (2) pourvu d'une grille mobile (7) qui est séparée d'une zone de canal (K) par une cavité (11), la zone de canal (K) étant couverte par une couche d'isolation de grille (3).
Latest bibliographic data on file with the International Bureau