Processing

Please wait...

Settings

Settings

Goto Application

1. WO2013032949 - TEST OBJECT FOR TESTING AN ARRAY OF BEAMS

Publication Number WO/2013/032949
Publication Date 07.03.2013
International Application No. PCT/US2012/052385
International Filing Date 24.08.2012
IPC
G01N 23/225 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/-G01N17/178
22by measuring secondary emission from the material
225using electron or ion microprobes
CPC
H01J 2237/2817
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
28Scanning microscopes
2813characterised by the application
2817Pattern inspection
H01J 2237/2826
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
26Electron or ion microscopes
282Determination of microscope properties
2826Calibration
H01J 37/263
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
261Details
263Contrast, resolution or power of penetration
H01J 37/28
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron or ion diffraction tubes
28with scanning beams
Applicants
  • APPLIED MATERIALS ISRAEL, LTD. [IL]/[IL] (AllExceptUS)
  • APPLIED MATERIALS, INC. [US]/[US] (ZW)
  • CARL ZEISS SMT GMBH [DE]/[DE] (AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BE, BF, BG, BH, BJ, BN, BR, BW, BY, BZ, CA, CF, CG, CH, CI, CL, CM, CN, CO, CR, CU, CY, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, FR, GA, GB, GD, GE, GH, GM, GN, GQ, GR, GT, GW, HN, HR, HU, ID, IE, IL, IN, IS, IT, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LV, LY, MA, MC, MD, ME, MG, MK, ML, MN, MR, MT, MW, MX, MY, MZ, NA, NE, NG, NI, NL, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SI, SK, SL, SM, SN, ST, SV, SY, SZ, TD, TG, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, ZA, ZM)
  • ROSENBERG, Zvika [IL]/[IL] (UsOnly)
  • ELMALIACH, Nissim [IL]/[IL] (UsOnly)
  • ZEIDLER, Dirk [DE]/[DE] (UsOnly)
  • KEMEN, Thomas [DE]/[DE] (UsOnly)
Inventors
  • ROSENBERG, Zvika
  • ELMALIACH, Nissim
  • ZEIDLER, Dirk
  • KEMEN, Thomas
Agents
  • FAHMI, Tarek, N.
Priority Data
1114846.728.08.2011GB
61/527,70726.08.2011US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) TEST OBJECT FOR TESTING AN ARRAY OF BEAMS
(FR) OBJET D'ESSAI SERVANT À TESTER UN RÉSEAU DE FAISCEAUX
Abstract
(EN) A test object for testing a multiple beam system is provided. The test object includes multiple regions, each made up of multiple fields, each of which includes multiple sub-fields, each of which includes multiple structural elements. The location and number of sub-fields of at least one field corresponds to the number of beams of an array of beams of the multiple beam system and to an expected spatial relationship between the beams of the array of beams. Various scanning patterns can be applied in order to allow the array of beams to scan the entire field. Images of the subfields obtained using the multiple beam system are used to evaluate spatial or optical characteristics thereof.
(FR) La présente invention concerne un objet d'essai servant à tester un système à plusieurs faisceaux. L'objet d'essai comprend de multiples régions, chacune étant composée de multiples champs incluant chacun de multiples sous-champs incluant chacun de multiples éléments de structure. L'emplacement et le nombre de sous-champs d'au moins un champ correspondent au nombre de faisceaux d'un réseau de faisceaux du système à plusieurs faisceaux et à une relation spatiale attendue entre les faisceaux du réseau de faisceaux. Divers profils de balayage peuvent être appliqués afin de permettre au réseau de faisceaux de balayer la totalité du champ. Les images des sous-champs obtenues au moyen du système à plusieurs faisceaux sont utilisées pour évaluer leurs caractéristiques spatiales ou optiques.
Latest bibliographic data on file with the International Bureau