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1. WO2013015121 - PHOTOSENSITIVE COMPOSITION, MASTER PLATE FOR PLANOGRAPHIC PRINTING PLATE, POLYURETHANE, AND METHOD FOR PRODUCING POLYURETHANE

Publication Number WO/2013/015121
Publication Date 31.01.2013
International Application No. PCT/JP2012/067741
International Filing Date 11.07.2012
IPC
G03F 7/035 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
035the binders being polyurethanes
C08G 18/32 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
30Low-molecular-weight compounds
32Polyhydroxy compounds; Polyamines; Hydroxy amines
C08G 63/12 2006.01
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
63Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
02Polyesters derived from hydroxy carboxylic acids or from polycarboxylic acids and polyhydroxy compounds
12derived from polycarboxylic acids and polyhydroxy compounds
G03F 7/00 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F 7/004 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
G03F 7/032 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
032with binders
CPC
B41C 1/1008
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
1Forme preparation
10for lithographic printing; Master sheets for transferring a lithographic image to the forme
1008by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
B41C 2210/04
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2210Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
04Negative working, i.e. the non-exposed (non-imaged) areas are removed
B41C 2210/06
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2210Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
06Developable by an alkaline solution
B41C 2210/266
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
CPROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
2210Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
26characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
266Polyurethanes; Polyureas
C08G 18/0823
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
08Processes
0804Manufacture of polymers containing ionic or ionogenic groups
0819containing anionic or anionogenic groups
0823containing carboxylate salt groups or groups forming them
C08G 18/282
CCHEMISTRY; METALLURGY
08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
18Polymeric products of isocyanates or isothiocyanates
06with compounds having active hydrogen
28characterised by the compounds used containing active hydrogen
2805Compounds having only one group containing active hydrogen
2815Monohydroxy compounds
282Alkanols, cycloalkanols or arylalkanols including terpenealcohols
Applicants
  • 富士フイルム株式会社 FUJIFILM Corporation [JP]/[JP] (AllExceptUS)
  • 田口 貴規 TAGUCHI, Yoshinori [JP]/[JP] (UsOnly)
  • 有冨 隆志 ARIDOMI, Takashi [JP]/[JP] (UsOnly)
Inventors
  • 田口 貴規 TAGUCHI, Yoshinori
  • 有冨 隆志 ARIDOMI, Takashi
Agents
  • 中島 淳 NAKAJIMA, Jun
Priority Data
2011-16477827.07.2011JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) PHOTOSENSITIVE COMPOSITION, MASTER PLATE FOR PLANOGRAPHIC PRINTING PLATE, POLYURETHANE, AND METHOD FOR PRODUCING POLYURETHANE
(FR) COMPOSITION PHOTOSENSIBLE, PLAQUE MAÎTRE POUR UNE PLAQUE D'IMPRESSION PLANOGRAPHIQUE, POLYURÉTHANE ET PROCÉDÉ DE PRODUCTION DE POLYURÉTHANE
(JA) 感光性組成物、平版印刷版原版、ポリウレタン及びポリウレタンの製造方法
Abstract
(EN)
A photosensitive composition comprising (A) a polyurethane produced by reacting a diol component comprising a compound represented by general formula (I) with a polyisocyanate component and (B) a photosensitive component. In general formula (I), A represents a single bond or a bivalent linking group containing an atom selected from a carbon atom, a hydrogen atom and an oxygen atom; B represents a monovalent organic group; R1 to R5 independently represent a hydrogen atom or an alkyl group; and m represents an integer of 0 to 3 and n represents an integer of 0 to 3, wherein m+n is not 0.
(FR)
L'invention porte sur une composition photosensible comprenant (A) un polyuréthane obtenu par réaction d'un composant diol comprenant un composé représenté par la formule générale (I) avec un composant polyisocyanate et (B) un composant photosensible. Dans la formule générale (I), A représente une liaison simple ou un groupe de liaison bivalent contenant un atome choisi parmi un atome de carbone, un atome d'hydrogène et un atome d'oxygène ; B représente un groupe organique monovalent ; R1 à R5 représentent indépendamment un atome d'hydrogène ou un groupe alkyle ; et m représente un entier de 0 à 3 et n représente un entier de 0 à 3, m+n n'étant pas 0.
(JA)
 (A)下記一般式(I)で表される化合物を含むジオール成分とポリイソシアネート成分とを反応させて得られるポリウレタン、及び(B)感光性成分を含有する感光性組成物である。一般式(I)中、Aは単結合又は炭素原子、水素原子、及び酸素原子から選ばれた原子を含んで構成される2価の連結基を表し、Bは一価の有機基を表す。R~Rはそれぞれ独立に水素原子又はアルキル基を表す。mは0~3の整数を表し、nは0~3の整数を表し、m+nが0となることはない。
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