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1. WO2013012481 - METHOD FOR IMPROVING PRINT PERFORMANCE OF FLEXOGRAPHIC PRINTING ELEMENTS

Publication Number WO/2013/012481
Publication Date 24.01.2013
International Application No. PCT/US2012/040159
International Filing Date 31.05.2012
IPC
G03F 7/11 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
11having cover layers or intermediate layers, e.g. subbing layers
B41N 1/06 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE OR CONSERVING THEM
1Printing plates or foils; Materials therefor
04metallic
06for relief printing or intaglio printing
CPC
G03F 1/50
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
1Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
G03F 5/00
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
5Screening processes; Screens therefor
G03F 5/20
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
5Screening processes; Screens therefor
20using screens for gravure printing
G03F 7/092
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
004Photosensitive materials
09characterised by structural details, e.g. supports, auxiliary layers
092characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
G03F 7/202
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
2002with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
202Masking pattern being obtained by thermal means, e.g. laser ablation
Applicants
  • MACDERMID PRINTING SOLUTIONS, LLC [US]/[US] (AllExceptUS)
  • COOK, Brian [US]/[US] (UsOnly)
  • RECCHIA, David, A. [US]/[US] (UsOnly)
  • GOTSICK, Timothy [US]/[US] (UsOnly)
Inventors
  • COOK, Brian
  • RECCHIA, David, A.
  • GOTSICK, Timothy
Agents
  • CORDANI, John, L.
Priority Data
13/183,55815.07.2011US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) METHOD FOR IMPROVING PRINT PERFORMANCE OF FLEXOGRAPHIC PRINTING ELEMENTS
(FR) PROCÉDÉ D'AMÉLIORATION DE PERFORMANCE D'IMPRESSION D'ÉLÉMENTS D'IMPRESSION FLEXOGRAPHIQUE
Abstract
(EN)
A method of making a relief image printing element having a relief pattern, the method comprising the steps of: a) selectively ablating the masking layer to create an overall image in the masking layer, such that the overall image comprises a sub-image, comprising a pattern of cells, in it; b) applying an oxygen barrier layer on top of the masking layer; c) exposing the printing element to actinic radiation through the oxygen barrier layer and the masking layer to selectively crosslink: and cure the at least one photocurable layer, thereby creating the relief image therein and a textured surface on the printing element; and d) developing the printing blank by removing the barrier layer and the uncured portions of the photocmable layer to reveal the relief image.
(FR)
L'invention porte sur un procédé de réalisation d'un élément d'impression d'image en relief ayant un motif en relief, le procédé comprenant les étapes consistant à : a) réaliser de façon sélective une ablation de la couche masquante pour créer une image globale dans la couche masquante, de telle sorte que l'image globale comprend dans celle-ci une sous-image, comprenant un motif de cellules ; b) appliquer une couche de barrière à l'oxygène sur le dessus de la couche masquante ; c) exposer l'élément d'impression à un rayonnement actinique à travers la couche de barrière à l'oxygène et la couche masquante pour une réticulation sélective, et durcir la ou les couches photodurcissables, créant ainsi une image en relief dans celles-ci et une surface texturée sur l'élément d'impression ; et d) développer l'ébauche d'impression par retrait de la couche de barrière et des parties non durcies de la couche photodurcissable pour révéler l'image en relief.
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