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1. WO2013011784 - METAL WITH DIAMOND-LIKE CARBON FILM, AND METHOD FOR FORMING DIAMOND-LIKE CARBON FILM

Publication Number WO/2013/011784
Publication Date 24.01.2013
International Application No. PCT/JP2012/065527
International Filing Date 18.06.2012
IPC
C23C 16/26 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
22characterised by the deposition of inorganic material, other than metallic material
26Deposition of carbon only
CPC
C23C 16/0227
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
02Pretreatment of the material to be coated
0227by cleaning or etching
C23C 16/045
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
04Coating on selected surface areas, e.g. using masks
045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
C23C 16/26
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
26Deposition of carbon only
C23C 16/27
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
22characterised by the deposition of inorganic material, other than metallic material
26Deposition of carbon only
27Diamond only
C23C 16/46
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
44characterised by the method of coating
46characterised by the method used for heating the substrate
Y10T 428/13
YSECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
10TECHNICAL SUBJECTS COVERED BY FORMER USPC
TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
428Stock material or miscellaneous articles
13Hollow or container type article [e.g., tube, vase, etc.]
Applicants
  • 国立大学法人電気通信大学 The University of Electro-Communications [JP]/[JP] (AllExceptUS)
  • 田中 勝己 TANAKA, Katsumi [JP]/[JP] (UsOnly)
  • チュウ チャオ キョン CHOO, Cheow Keong [MY]/[JP] (UsOnly)
Inventors
  • 田中 勝己 TANAKA, Katsumi
  • チュウ チャオ キョン CHOO, Cheow Keong
Agents
  • 三好 秀和 MIYOSHI, Hidekazu
Priority Data
2011-16025821.07.2011JP
2012-08739506.04.2012JP
Publication Language Japanese (JA)
Filing Language Japanese (JA)
Designated States
Title
(EN) METAL WITH DIAMOND-LIKE CARBON FILM, AND METHOD FOR FORMING DIAMOND-LIKE CARBON FILM
(FR) MÉTAL DOTÉ D'UN FILM DE CARBONE DU TYPE DIAMANT ET PROCÉDÉ DE FORMATION D'UN FILM DE CARBONE DU TYPE DIAMANT
(JA) ダイヤモンドライクカーボン膜付き金属物、および、ダイヤモンドライクカーボン膜の形成方法
Abstract
(EN)
The present invention addresses the problem of providing a metal with a diamond-like carbon film easily obtained by forming a diamond-like carbon film on a metal, and of providing a method for forming the diamond-like carbon film. A metal object on which the diamond-like carbon film is to be formed (30) is arranged in a flow channel (14) where the gas (RG), including methane gas, used for forming the film is directed. The gas (RG) used for forming the film is directed in a prescribed flow quantity through the flow channel (14) at the same time that the object on which the film is to be formed (30) is heated from room temperature to a predetermined temperature, whereby a reaction is created between impurities on the surface (30f) of the object on which the film is to be formed and the gas (RG) used for forming the film, resulting in removal of the impurities from the surface (30f) of the object on which the film is to be formed, and further causing a reaction from the gas (RG) used for forming the film in response to the metal elements exposed by removal of the impurities, forming the diamond-like carbon film (34) on the surface (30f) of the object on which the film is to be formed.
(FR)
L'objet de la présente invention est de fournir un métal doté d'un film de carbone du type diamant obtenu facilement par formation d'un film de carbone du type diamant sur un métal et de fournir un procédé de formation du film de carbone du type diamant. Un objet métallique sur lequel le film de carbone du type diamant doit être formé (30) est disposé dans un canal d'écoulement (14) dans lequel le gaz (RG), y compris le gaz méthane, utilisé pour former le film est dirigé. Le gaz (RG) utilisé pour former le film est dirigé selon une quantité d'écoulement prescrite à travers le canal d'écoulement (14) au moment où l'objet sur lequel le film doit être formé (30) est chauffé de la température ambiante à une température prédéterminée, une réaction étant créée entre des impuretés sur la surface (30f) de l'objet sur lequel le film doit être formé et le gaz (RG) utilisé pour former le film, ce qui entraîne une élimination des impuretés à partir de la surface (30f) de l'objet sur lequel le film doit être formé, et provoque en outre une réaction à partir du gaz (RG) utilisé pour former le film en réponse aux éléments métalliques exposés par élimination des impuretés, formant le film en carbone du type diamant (34) sur la surface (30f) de l'objet sur lequel le film doit être formé.
(JA)
 金属上にダイヤモンドライクカーボン膜を容易に成膜してなるダイヤモンドライクカーボン膜付き金属物、および、ダイヤモンドライクカーボン膜の形成方法を提供することを課題とする。メタンガスを含む成膜用ガスRGを流動させる流動経路14に、ダイヤモンドライクカーボン膜の成膜対象となる金属製の成膜対象物30を配置する。そして、成膜用ガスRGを所定流量で流動経路14に流すとともに成膜対象物30を室温から所定温度にまで上昇させるプロセスを経ることにより、成膜対象面30fの不純物と成膜用ガスRGとを反応させることで成膜対象面30fから不純物を除去し、更に、不純物が除去されることで露出した金属元素によって成膜用ガスRGを反応させて成膜対象面30fにダイヤモンドライクカーボン膜34を成膜する。
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