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1. (WO2012178177) MICROPLASMA JET DEVICES, ARRAYS, MEDICAL DEVICES AND METHODS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/178177 International Application No.: PCT/US2012/044037
Publication Date: 27.12.2012 International Filing Date: 25.06.2012
IPC:
H05H 1/24 (2006.01) ,H05H 1/30 (2006.01) ,H05H 1/34 (2006.01)
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
26
Plasma torches
30
using applied electromagnetic fields, e.g. high-frequency or microwave energy
H ELECTRICITY
05
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
H
PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY- CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
1
Generating plasma; Handling plasma
24
Generating plasma
26
Plasma torches
32
using an arc
34
Details, e.g. electrodes, nozzles
Applicants:
THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS; 506 South Wright Street 352 Henry Administration Building Urbana, IL 61801, US (AllExceptUS)
EDEN, J., Gary [US/US]; US (UsOnly)
PARK, Sung-Jin [KR/US]; US (UsOnly)
CHO, Jin, Hoon [KR/US]; US (UsOnly)
MA, H., Jeffrey [US/US]; US (UsOnly)
Inventors:
EDEN, J., Gary; US
PARK, Sung-Jin; US
CHO, Jin, Hoon; US
MA, H., Jeffrey; US
Agent:
FALLON, Steven, P.; Greer, Burns & Crain Ltd. 300 South Wacker Drive, Suite 2500 Chicago, IL 60606, US
Priority Data:
61/501,05324.06.2011US
Title (EN) MICROPLASMA JET DEVICES, ARRAYS, MEDICAL DEVICES AND METHODS
(FR) DISPOSITIFS MICROJETS DE PLASMA, MATRICES, DISPOSITIFS MÉDICAUX ET PROCÉDÉS
Abstract:
(EN) Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.
(FR) La présente invention concerne des dispositifs microjets de plasma et des matrices de divers matériaux, et des dispositifs de microjets de plasma à faible température et des matrices de ceux-ci. L'invention comprend ainsi des dispositifs préférés à un seul microjet de plasma et des matrices de dispositifs formées dans des blocs de polymères monolithiques dotés de microcavités allongées. Les matrices peuvent être regroupées de manière dense, de sorte à obtenir par exemple 100 jets sur une surface de quelques centimètres carrés. D'autres modes de réalisation comprennent des dispositifs microjets de plasma en métal/oxyde métallique dotés de microbuses en ce même oxyde métallique. L'invention concerne également des procédés de fabrication des dispositifs microjets de plasma, et ces procédés se sont avérés capables de produire des contours de microbuses bien définies qui ne forment qu'un avec les électrodes isolées par le matériau.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020140031979