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1. (WO2012175307) METHOD AND DEVICE FOR DEPOSITING OLEDS
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/175307 International Application No.: PCT/EP2012/060239
Publication Date: 27.12.2012 International Filing Date: 31.05.2012
IPC:
C23C 14/12 (2006.01) ,C23C 14/24 (2006.01) ,C23C 14/22 (2006.01) ,H01L 51/00 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
06
characterised by the coating material
12
Organic material
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
24
Vacuum evaporation
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22
characterised by the process of coating
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
51
Solid state devices using organic materials as the active part, or using a combination of organic materials with other materials as the active part; Processes or apparatus specially adapted for the manufacture or treatment of such devices, or of parts thereof
Applicants:
AIXTRON SE; Kaiserstraße 98 52134 Herzogenrath, DE (AllExceptUS)
LONG, Michael [US/DE]; DE (UsOnly)
GERSDORFF, Markus [DE/DE]; DE (UsOnly)
Inventors:
LONG, Michael; DE
GERSDORFF, Markus; DE
Agent:
GRUNDMANN, Dirk; Rieder & Partner Corneliusstraße 45 42329 Wuppertal, DE
Priority Data:
102011051260.822.06.2011DE
Title (DE) VERFAHREN UND VORRICHTUNG ZUM ABSCHEIDEN VON OLED'S
(EN) METHOD AND DEVICE FOR DEPOSITING OLEDS
(FR) PROCÉDÉ ET DISPOSITIF POUR LE DÉPÔT DE DIODES ÉLECTROLUMINESCENTES ORGANIQUES
Abstract:
(DE) Die Erfindung betrifft zunächst ein Verfahren zum Abscheiden eines organischen Ausgangsstoffs als Schicht auf einem Substrat (18), wobei der organische Ausgangsstoff in Form von Schwebeteilchen in einen Trägergasstrom gebracht wird, das so erzeugte Aerosol als vorbestimmter Massenfluss des organischen Materials einem Verdampfer (5) zugeleitet wird, welcher Verdampfer (5) einen Verdampfungskörper (6 - 10) mit einer großen Oberfläche aufweist, der auf eine Verdampfungstemperatur aufgeheizt wird, bei der die in die Nähe oder in Kontakt mit der Oberfläche des Verdampfungskörpers (6 - 10) tretenden Schwebeteilchen verdampfen, der so erzeugte Dampf vom Trägergasstrom in eine Prozesskammer (17) gebracht wird, wo er auf der Oberfläche eines Substrates (18) die Schicht bildend kondensiert. Um den Dampfzufluss zur Prozesskammer zu vergleichmäßigen, wird vorgeschlagen, dass zur Erzeugung eines mit dem Dampf des verdampften organischen Ausgangsstoffes gesättigten Trägergasstrom zur Prozesskammer, zumindest in einer Phase des Abscheideprozesses, insbesondere in einer Anfangsphase des Abscheideprozesses der Massenfluss der Schwebeteilchen zum Verdampfer (5) größer ist als die Verdampfungsrate der Schwebeteilchen im Verdampfer (5). Außerdem betrifft die Erfindung eine Vorrichtung zum Abscheiden eines organischen Ausgangsstoffes als Schicht auf einem Substrat.
(EN) The invention first relates to a method for depositing an organic starting material as a layer on a substrate (18), wherein the organic starting material is introduced in the form of suspended particles in a carrier gas flow, the aerosol thus created is supplied as a predetermined mass flow of the organic material to an evaporator (5), which evaporator (5) comprises an evaporation body (6 - 10) which has a large surface and is heated to an evaporation temperature at which the suspended particles entering the vicinity of, or making contact with, the surface of the evaporation body (6 - 10) evaporate, the steam of the carrier gas flow thus created is introduced into a process chamber (17) where it condenses on the surface of a substrate (18), thus forming the layer. In order to make the steam inflow to the process chamber more uniform, according to the invention the mass flow of suspended particles to the evaporator (5) is greater than the evaporation rate of the suspended particles in the evaporator (5) such as to create a carrier gas flow saturated with the steam of the evaporated organic starting material to the process chamber, at least during one phase of the deposition process, in particular during a starting phase of the deposition process. The invention further relates to a device for depositing an organic starting material as a layer on a substrate.
(FR) L'invention concerne en premier lieu un procédé pour le dépôt d'une matière de départ organique sous forme de couche sur un substrat (18). Selon ledit procédé, la matière de départ organique est introduite dans un courant de gaz vecteur sous forme de particules en suspension, l'aérosol ainsi produit est acheminé à un débit massique prédéfini de la matière organique jusqu'à un évaporateur (5) pourvu d'un corps (6 - 10) présentant une grande surface qui est chauffé à une température de vaporisation à laquelle les particules en suspension arrivant à proximité ou au contact de la surface du corps (6 - 10) de l'évaporateur se vaporisent, et la vapeur ainsi formée est acheminée par le courant de gaz vecteur dans une chambre de traitement (17) où elle se condense sur la surface d'un substrat (18), formant ainsi une couche. L'objet de la présente invention est d'homogénéiser le flux de vapeur parvenant dans la chambre de traitement. A cet effet, pour produire un courant de gaz vecteur, saturé en vapeur de la matière de départ organique vaporisée, pénétrant dans la chambre de traitement, au moins dans une phase du processus de dépôt, en particulier dans une phase de démarrage du processus de dépôt, le débit massique des particules en suspension acheminées vers l'évaporateur (5) est supérieur à la vitesse de vaporisation des particules en suspension dans l'évaporateur (5). La présente invention concerne en outre un dispositif pour le dépôt d'une matière de départ organique sous forme de couche sur un substrat.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: German (DE)
Filing Language: German (DE)
Also published as:
JP2014523486KR1020140053972