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1. (WO2012173431) METHOD FOR MANUFACTURING A PATTERNED PHASE RETARDATION FILM
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/173431 International Application No.: PCT/KR2012/004753
Publication Date: 20.12.2012 International Filing Date: 15.06.2012
IPC:
B41M 5/36 (2006.01) ,B41M 5/50 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
M
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
5
Duplicating or marking methods; Sheet materials for use therein
26
Thermography
36
using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its properties, e.g. of its optical, hydrophobic-hydrophilic, solubility or permeability properties
B PERFORMING OPERATIONS; TRANSPORTING
41
PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
M
PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
5
Duplicating or marking methods; Sheet materials for use therein
50
Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
Applicants:
주식회사 동진쎄미켐 DONGJIN SEMICHEM CO., LTD. [KR/KR]; 인천시 서구 가좌동 472-2 Gajwa-dong 472-2, Seo-gu Incheon-city 404-250, KR (AllExceptUS)
이성규 LEE, Seng Kue [KR/KR]; KR (UsOnly)
최진욱 CHOI, Jin-Wook [KR/KR]; KR (UsOnly)
김성민 KIM, Sung-Min [KR/KR]; KR (UsOnly)
이승희 LEE, Seung-Hee [KR/KR]; KR (UsOnly)
이명훈 LEE, Myong-Hoon [KR/KR]; KR (UsOnly)
강신웅 KANG, Shin-Woong [KR/KR]; KR (UsOnly)
정광운 JEONG, Kwang-Un [KR/KR]; KR (UsOnly)
Inventors:
이성규 LEE, Seng Kue; KR
최진욱 CHOI, Jin-Wook; KR
김성민 KIM, Sung-Min; KR
이승희 LEE, Seung-Hee; KR
이명훈 LEE, Myong-Hoon; KR
강신웅 KANG, Shin-Woong; KR
정광운 JEONG, Kwang-Un; KR
Agent:
유미특허법인 YOU ME PATENT AND LAW FIRM; 서울시 강남구 역삼동 649-10 서림빌딩 Seolim Bldg., 649-10 Yoksam-dong Kangnam-Ku Seoul 135-080, KR
Priority Data:
10-2011-005848516.06.2011KR
Title (EN) METHOD FOR MANUFACTURING A PATTERNED PHASE RETARDATION FILM
(FR) PROCÉDÉ DE FABRICATION D'UN FILM DE RETARD DE PHASE À MOTIF
(KO) 패턴된 위상지연필름의 제조방법
Abstract:
(EN) The present invention relates to a method for manufacturing a patterned phase retardation film, and more particularly, to a method which involves printing different types of aligning agents such that the aligning agents can be crossed with each other so as to have a predetermined gap therebetween, so as to thereby manufacture a patterned phase retardation film using only a single alignment process. The present invention also relates to a patterned phase retardation film manufactured by the method. The method for manufacturing the patterned phase retardation film according to the present invention may enable the formation of different types of aligning agents, having different aligning properties, on a substrate by means of a printing technique, such that the aligning agents can be crossed with each other so as to have a predetermined gap therebetween. Thus, a pattern having significantly improved linearity as compared to those patterns produced through processes using an existing mask can be obtained to enable the manufacture of an elaborate phase retardation film. Furthermore, a patterned phase retardation film can be manufactured using just a single process for forming aligning properties, thus reducing the number of manufacturing processes to half that of conventional techniques, and providing excellent effects in terms of the simplification of processes and the resulting reduction in costs.
(FR) La présente invention concerne un procédé de fabrication d'un film de retard de phase à motif, et, plus particulièrement, un procédé qui met en jeu l'impression de différents types d'agents d'alignement de sorte que les agents d'alignement puissent être croisés entre eux de façon à avoir un intervalle prédéterminé entre eux, permettant ainsi de fabriquer un film de retard de phase à motif à l'aide seulement d'un simple procédé d'alignement. La présente invention concerne également un film de retard de phase à motif fabriqué par le procédé. Le procédé de fabrication du film de retard de phase à motif selon la présente invention peut permettre la formation de différents types d'agents d'alignement, ayant différentes propriétés d'alignement, sur un substrat au moyen d'une technique d'impression, de sorte que les agents d'alignement puissent être croisés l'un avec l'autre entre eux de façon à avoir un intervalle prédéterminé entre eux. Ainsi, un motif ayant une linéarité significativement améliorée par comparaison avec les motifs produits par des procédés à l'aide d'un masque existant peut être obtenu pour permettre la fabrication d'un film de retard de phase élaboré. De plus, un film de retard de phase à motif peut être fabriqué en utilisant juste un procédé unique pour former des propriétés d'alignement, réduisant ainsi le nombre de processus de fabrication à la moitié de ceux des techniques classiques, et fournissant d'excellents effets en termes de la simplification des procédés et de la réduction résultante des coûts.
(KO) 본 발명은 패턴된 위상지연필름의 제조 방법에 관한 것으로, 더욱 상세하게는 서로 다른 종류의 배향제를 일정간격으로 교차되도록 프린팅하여 1회의 배향 공정만으로도 패턴된 위상지연필름을 제조할 수 있는 방법 및 그러한 방법에 의해 제조된 패턴된 위상지연필름에 관한 것이다. 본 발명에 따른 패턴된 위상지연필름 제조방법은 서로 다른 배향성을 가지는 이종의 배향제를 프린팅 기술을 이용하여 일정간격으로 교차되도록 기판 상에 형성하므로, 기존의 마스크를 이용한 공정에 비하여 월등하게 향상된 패턴의 직진성을 나타내어 정교한 위상지연필름을 제조할 수 있고, 단 1회의 배향성 형성 공정으로 패턴된 위상지연필름의 제조가 가능하므로 종래 기술에 비하여 제조 공정이 반으로 줄어들어 공정의 간소화 및 그에 따른 비용 절감의 효과가 뛰어나다.
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Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Korean (KO)
Filing Language: Korean (KO)