Search International and National Patent Collections
Some content of this application is unavailable at the moment.
If this situation persists, please contact us atFeedback&Contact
1. (WO2012172213) DEVICE FOR MANAGING HEAT IN AN OPTICAL ELEMENT, AND RELATED HEAT-MANAGEMENT METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2012/172213 International Application No.: PCT/FR2012/050850
Publication Date: 20.12.2012 International Filing Date: 18.04.2012
IPC:
H01S 3/04 (2006.01) ,H01S 3/042 (2006.01) ,H01S 3/06 (2006.01) ,H01S 5/024 (2006.01) ,H01S 3/08 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
02
Constructional details
04
Cooling arrangements
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
02
Constructional details
04
Cooling arrangements
042
for solid state lasers
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
05
Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
06
Construction or shape of active medium
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
5
Semiconductor lasers
02
Structural details or components not essential to laser action
024
Cooling arrangements
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
S
DEVICES USING STIMULATED EMISSION
3
Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves
05
Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
08
Construction or shape of optical resonators or components thereof
Applicants:
ECOLE POLYTECHNIQUE [FR/FR]; Route de Saclay F-91120 Palaiseau, FR (AllExceptUS)
ALBACH, Daniel [DE/FR]; FR (UsOnly)
CHANTELOUP, Jean-Christophe [FR/FR]; FR (UsOnly)
LUCIANETTI, Antonio [IT/FR]; CZ (UsOnly)
NOVO, Thierry [FR/FR]; FR (UsOnly)
VINCENT, Bernard [FR/FR]; FR (UsOnly)
Inventors:
ALBACH, Daniel; FR
CHANTELOUP, Jean-Christophe; FR
LUCIANETTI, Antonio; CZ
NOVO, Thierry; FR
VINCENT, Bernard; FR
Agent:
PONTET ALLANO & ASSOCIES; 25 rue Jean Rostand Parc Orsay Université F-91893 Orsay Cedex, FR
Priority Data:
115335818.04.2011FR
Title (EN) DEVICE FOR MANAGING HEAT IN AN OPTICAL ELEMENT, AND RELATED HEAT-MANAGEMENT METHOD
(FR) DISPOSITIF POUR LA GESTION THERMIQUE D'UN ELEMENT OPTIQUE ET PROCEDE DE GESTION THERMIQUE ASSOCIE
Abstract:
(EN) The present invention relates to a device (1) for managing heat in an optical element (2), including: the optical element (2); a material (5) at a reference temperature; and an intermediate gas layer (4) located directly between the reference-temperature material (5) and the optical element (2), said intermediate gas layer (4) being located on at least a portion of the thickness thereof in the so-called temporary diffusion state defined by a thickness of the intermediate gas layer (4), such that the ratio of the mean free path of the gas molecules in the intermediate gas layer (4) over said thickness is between 0.1 and 10. The invention is characterized in that the thickness of the intermediate gas layer is between 10 µm and 5 mm. The invention also relates to a heat-management method implemented in said device (1) to manage the temperature of an optical element (2). See FIG. 1.
(FR) La présente invention concerne un dispositif (1) pour la gestion ther¬ mique d'un élément optique (2), comprenant : • - l'élément optique (2); • - un matériau (5) à une température de référence; et • - une couche intermédiaire gazeuse (4) située directement entre le matériau (5) à une température de référence et l'élément op¬ tique (2), ladite couche intermédiaire gazeuse (4) se trouvant sur au moins une partie de son épaisseur dans le régime de diffusion dit « transitoire » défini par une épaisseur de la couche intermé¬ diaire gazeuse (4) telle que le rapport du libre parcours moyen des molécules de gaz dans la couche intermédiaire gazeuse (4) sur la¬ dite épaisseur soit compris entre 0,1 et 10, et en ce que l'épaisseur de la couche intermédiaire gazeuse est comprise entre ΙΟμιη et 5mm. L'invention concerne aussi un procédé de gestion thermique mis en oeuvre dans ce dispositif (1), pour gérer la température d'un élément optique (2). Voir Figure 1.
front page image
Designated States: AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: French (FR)
Filing Language: French (FR)
Also published as:
US20140036946EP2700131CN103636082JP2014517504FR2974251